SCHEMBL6008241

SCHEMBL6008241

OCOc1nc(OCO)nc(OCO)n1

nearest known ligand 0.41

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.41
MAPK1 P28482 1/20 0.41
HSD17B10 Q99714 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL600149 0.73 SLC29A1 (0.48) POLBMAPK1HSD17B10
SCHEMBL12384254 0.67 LOX (0.42) POLBMAPK1HSD17B10
SCHEMBL19166260 0.64 SLC29A1 (0.42) POLBMAPK1HSD17B10
SCHEMBL15250874 0.64 CYP1A2 (0.44) HSD17B10
SCHEMBL15250902 0.61 MEN1 (0.40) POLBMAPK1HSD17B10
SCHEMBL11343343 0.61 LMNA (0.46) POLBMAPK1HSD17B10
SCHEMBL632364 0.60 PDE10A (0.39) POLBMAPK1HSD17B10
SCHEMBL23181 0.58 MAPK1 (0.55) POLBMAPK1HSD17B10
SCHEMBL14944760 0.57 ALDH1A1 (0.33) MAPK1
SCHEMBL1244232 0.48 NOTUM (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101407597-B Halogen-free flame-retardant photo-curing epoxy resin composition SHANGHAI RES INST CHEMICAL IND 2011-09-14 CN claimed
CN-101367927-B Process for preparing flame-proof polyether SHANDONG XINQUAN PHARM INTERMEDIATE CO LTD 2011-02-02 CN claimed
CN-101407597-A Halogen-free flame-retardant photo-curing epoxy resin composition SHANGHAI RES INST CHEMICAL IND (CN) 2009-04-15 CN claimed
CN-101367927-A Process for preparing flame-proof polyether YIYUAN XINQUAN CHEMICAL CO LTD (CN) 2009-02-18 CN claimed
EP-1149426-B2 FORMED IN SITU SEPARATOR FOR A BATTERY EVEREADY BATTERY INC (US) 2006-09-20 EP claimed
CN-1257219-C Halogen less expansion type polyolefine incombustible agent and its preparation method SHANGHAI INST OF CHEMICAL ENGI (CN) 2006-05-24 CN claimed
CN-1556136-A Halogen less expansion type polyolefine incombustible agent and its preparation method 上海化工研究院 2004-12-22 CN claimed
EP-1149426-B1 FORMED IN SITU SEPARATOR FOR A BATTERY EVEREADY BATTERY INC (US) 2003-09-17 EP claimed
EP-1149426-A1 FORMED IN SITU SEPARATOR FOR A BATTERY Eveready Battery Company, Inc. (US) 2001-10-31 EP claimed
WO-2000036672-A1 FORMED IN SITU SEPARATOR FOR A BATTERY EVEREADY BATTERY COMPANY, INC. (US) 2000-06-22 WO claimed
CN-101407597-B Halogen-free flame-retardant photo-curing epoxy resin composition SHANGHAI RES INST CHEMICAL IND 2011-09-14 CN disclosed
CN-101475685-B Preparation of hyperbranched polymer and hyperbranched epoxy resin SUZHOU HYPERT RESIN SCIENCE & TECHNOLOGY CO LTD 2011-04-20 CN disclosed
CN-101475685-A Preparation method of hyperbranched polymer and hyperbranched epoxy resin SUZHOU HYPERT RESIN SCIENCE & (CN) 2009-07-08 CN disclosed
CN-101407597-A Halogen-free flame-retardant photo-curing epoxy resin composition SHANGHAI RES INST CHEMICAL IND (CN) 2009-04-15 CN disclosed
CN-1257219-C Halogen less expansion type polyolefine incombustible agent and its preparation method SHANGHAI INST OF CHEMICAL ENGI (CN) 2006-05-24 CN disclosed
CN-1556136-A Halogen less expansion type polyolefine incombustible agent and its preparation method 上海化工研究院 2004-12-22 CN disclosed
US-4167500-A ACETAL RESINS LORD CORPORATION (US) 1979-09-11 US disclosed
US-4031040-A Polyurethanes prepared from hydroxymethyl isocyanurates STAMICARBON B.V. (NL) 1977-06-21 US disclosed