Known targets — ChEMBL curated mechanism
AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA
The experimentally established mechanism targets of Fluoride Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride Ion SCHEMBL3942095 | 1.00 | CA4 (1.00) | — | |
| Fluoride Ion SCHEMBL4103147 | 1.00 | — | — | |
| Fluoride Ion SCHEMBL11692126 | 1.00 | CA4 (1.00) | — | |
| Fluoride Ion SCHEMBL29197882 | 1.00 | CA4 (1.00) | — | |
| Fluoride Ion SCHEMBL6175 | 1.00 | — | — | |
| Fluoride Ion SCHEMBL10521769 | 1.00 | — | — | |
| Fluoride Ion SCHEMBL28383261 | 1.00 | CA4 (1.00) | — | |
| Fluoride Ion F-18 SCHEMBL30465808 | 1.00 | — | — | |
| Fluoride Ion SCHEMBL7069643 | 0.82 | — | — | |
| Fluoride Ion SCHEMBL9747982 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 160 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12404207-B2 | Textured, antiglare glass articles and methods of making the same | CORNING INCORPORATED (US) | 2025-09-02 | — | — | US | claimed |
| US-12234215-B2 | Carbonate compound containing fluorosulfonyl group, and preparation method and use of same | SAMHWA PAINTS INDUSTRIES CO., LTD. (KR) | 2025-02-25 | — | — | US | claimed |
| CN-118895505-A | Double-agent type etching composition for copper and molybdenum-titanium alloy double-layer film | 四川和晟达电子科技有限公司 | 2024-11-05 | — | — | CN | claimed |
| US-20240317639-A1 | TEXTURED, ANTIGLARE GLASS ARTICLES AND METHODS OF MAKING THE SAME | CORNING INCORPORATED | 2024-09-26 | — | — | US | claimed |
| CN-118461006-A | Cu/Ti alloy double-type etching solution composition | 四川和晟达电子科技有限公司 | 2024-08-09 | — | — | CN | claimed |
| CN-118164686-A | Textured, antiglare glass article and method of making same | 康宁股份有限公司 | 2024-06-11 | — | — | CN | claimed |
| CN-114502515-B | Textured, antiglare glass article and method of making same | 康宁股份有限公司 | 2024-03-26 | — | — | CN | claimed |
| EP-4204478-B1 | SILICONE COMPOSITION, METHOD OF MAKING THE SAME, AND CABLE MADE FROM THE SAME | WACKER CHEMIE AG (DE) | 2024-03-20 | — | — | EP | claimed |
| US-20230407010-A1 | SILICONE COMPOSITION, METHOD OF MAKING THE SAME, AND CABLE MADE FROM THE SAME | WACKER CHEMIE AG (DE) | 2023-12-21 | — | — | US | claimed |
| WO-2023224240-A1 | POLYMER COMPOUND COMPRISING SULFONYL AZIDE GROUP OR SULFONYL FLUORIDE GROUP AT CHAIN END AND PREPARATION METHOD THEREFOR | 아주대학교산학협력단 | 2023-11-23 | — | — | WO | claimed |
| CN-109562956-B | Purified potassium hexafluoromanganate and method for purifying potassium hexafluoromanganate | 通用电气公司 | 2022-05-24 | — | — | CN | claimed |
| WO-2021050493-A1 | TEXTURED, ANTIGLARE GLASS ARTICLES AND METHODS OF MAKING THE SAME | CORNING INCORPORATED (US) | 2021-03-18 | — | — | WO | claimed |
| US-20210070652-A1 | TEXTURED, ANTIGLARE GLASS ARTICLES AND METHODS OF MAKING THE SAME | CORNING INCORPORATED | 2021-03-11 | — | — | US | claimed |
| CN-112121157-A | Composition based on enhanced vitamin D3, oral care gel and application thereof | 南京索伦威生物科技有限公司 | 2020-12-25 | — | — | CN | claimed |
| CN-107759443-A | A kind of high iodine class trifluoromethyl reagent of aryl and preparation and application | 东北师范大学 | 2018-03-06 | — | — | CN | claimed |
| US-8557651-B2 | Method of manufacturing a semiconductor device using an etchant | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-10-15 | — | — | US | claimed |
| US-20110217833-A1 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING AN ETCHANT | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-09-08 | — | — | US | claimed |
| US-20060124598-A1 | Difluoride composition, method of preparation, and use for frosting glass | SOCIETE D'EXPLOITATION DE PRODUITS POUR LES INDUSTRIES CHIMIQUES (SEPPIC) | 2006-06-15 | — | — | US | claimed |
| EP-1108773-B1 | Composition for roughening glass, etching bath, process for roughening glass and roughened objects | SEPPIC SA (FR) | 2005-05-11 | — | — | EP | claimed |
| US-5109079-A | Chain terminators | BAYER AKTIENGESELLSCHAFT (DE) | 1992-04-28 | — | — | US | claimed |