Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGS2 | P35354 | 10/20 | 0.49 |
| ▸ | PTGS1 | P23219 | 8/20 | 0.49 |
| ▸ | GRM1 | Q13255 | 2/20 | 0.40 |
| ▸ | LMNA | P02545 | 3/20 | 0.36 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.36 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.36 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.36 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.36 |
| ▸ | HTR2B | P41595 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.36 |
| ▸ | AKR1C3 | P42330 | 2/20 | 0.36 |
| ▸ | CXCR1 | P25024 | 2/20 | 0.36 |
| ▸ | CXCR2 | P25025 | 2/20 | 0.36 |
| ▸ | CXCL8 | P10145 | 2/20 | 0.36 |
| ▸ | ALB | P02768 | 1/20 | 0.36 |
| ▸ | ESR1 | P03372 | 1/20 | 0.36 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.36 |
| ▸ | RARB | P10826 | 1/20 | 0.36 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.36 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7102472 | 0.82 | PTGS2 (0.47) | PTGS2PTGS1LMNATRPA1SLC6A2 | |
| SCHEMBL25311714 | 0.80 | PTGS2 (0.43) | PTGS2PTGS1GRM1LMNACYP2C9 | |
| SCHEMBL490949 | 0.79 | PTGS2 (0.49) | PTGS2PTGS1GRM1LMNACYP2C9 | |
| SCHEMBL27456972 | 0.78 | TYR (0.40) | PTGS2PTGS1RARBGAAALDH1A1 | |
| SCHEMBL5394172 | 0.78 | LMNA (0.52) | PTGS1LMNATRPA1CHRM1SLC6A2 | |
| SCHEMBL29849603 | 0.78 | LMNA (0.52) | PTGS1LMNATRPA1CHRM1SLC6A2 | |
| SCHEMBL28616370 | 0.77 | ALDH1A1 (0.36) | GRM1LMNATRPA1CHRM1SLC6A2 | |
| SCHEMBL3833747 | 0.76 | PTGS2 (0.42) | PTGS2PTGS1GRM1LMNAGAA | |
| SCHEMBL28238190 | 0.76 | TRPA1 (0.62) | PTGS2PTGS1LMNATRPA1CHRM1 | |
| SCHEMBL6741099 | 0.75 | TRPA1 (0.39) | LMNATRPA1CHRM1SLC6A2ADRA1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8906598-B2 | Pattern forming method, method for manufacturing semiconductor device, and material for forming coating layer of resist pattern | FUJITSU LIMITED (JP) | 2014-12-09 | — | — | US | disclosed |
| US-8476346-B2 | Resist pattern thickening material, semiconductor device, and production method thereof | FUJITSU LIMITED (JP) | 2013-07-02 | — | — | US | disclosed |
| US-20120126372-A1 | RESIST PATTERN THICKENING MATERIAL AND PROCESS FOR FORMING RESIST PATTERN, AND SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2012-05-24 | — | — | US | disclosed |
| US-8129092-B2 | Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same | FUJITSU LIMITED (JP) | 2012-03-06 | — | — | US | disclosed |
| US-20110250541-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND MATERIAL FOR FORMING COATING LAYER OF RESIST PATTERN | FUJITSU LIMITED (JP) | 2011-10-13 | — | — | US | disclosed |
| US-20110101508-A1 | RESIST PATTERN THICKENING MATERIAL, SEMICONDUCTOR DEVICE, AND PRODUCTION METHOD THEREOF | FUJITSU LIMITED (JP) | 2011-05-05 | — | — | US | disclosed |
| US-7923573-B2 | Benzene compound having 2 or more substituents | DAIICHI SANKYO COMPANY, LIMITED (JP) | 2011-04-12 | — | — | US | disclosed |
| CN-1975571-B | Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same | FUJITSU LTD | 2011-04-06 | — | — | CN | disclosed |
| EP-1793274-A2 | Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same | FUJITSU LIMITED (JP) | 2007-06-06 | — | — | EP | disclosed |
| CN-1975571-A | Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same | FUJITSU LTD (JP) | 2007-06-06 | — | — | CN | disclosed |
| US-20070123623-A1 | Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same | FUJITSU LIMITED (JP) | 2007-05-31 | — | — | US | disclosed |