SCHEMBL6046352

SCHEMBL6046352

Cc1cc(CCNC(=O)c2ccccc2)ccc1O

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESRRG P62508 2/20 0.64
MEN1 O00255 3/20 0.64
KMT2A Q03164 3/20 0.64
GAA P10253 2/20 0.64
RAB9A P51151 6/20 0.58
NPC1 O15118 5/20 0.58
ERCC1 P07992 1/20 0.55
ERCC4 Q92889 1/20 0.55
ALPL P05186 1/20 0.53
CA1 P00915 1/20 0.53
CA2 P00918 1/20 0.53
CA7 P43166 1/20 0.53
CA9 Q16790 1/20 0.53
CA14 Q9ULX7 1/20 0.53
POLB P06746 2/20 0.53
HTT P42858 2/20 0.53
KDM4E B2RXH2 1/20 0.53
ALDH1A1 P00352 1/20 0.53
MAPT P10636 1/20 0.53
PKM P14618 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30668181 0.87 MEN1 (0.82) ESRRGMEN1KMT2AGAARAB9A
SCHEMBL9972948 0.85 RAB9A (0.61) ESRRGMEN1KMT2AGAARAB9A
SCHEMBL14259615 0.85 ESRRG (0.52) ESRRGMEN1KMT2AGAARAB9A
SCHEMBL6184638 0.85 MAPT (0.58) ESRRGMEN1KMT2AGAAERCC1
SCHEMBL5726019 0.82 ALDH1A1 (0.63) MEN1KMT2AGAARAB9ANPC1
SCHEMBL16091708 0.82 MEN1 (0.74) ESRRGMEN1KMT2AGAARAB9A
SCHEMBL19842170 0.81 CNR1 (0.61) MEN1KMT2ARAB9ANPC1ERCC1
SCHEMBL5969191 0.80 RAB9A (0.88) ESRRGRAB9ANPC1POLBALDH1A1
SCHEMBL15762685 0.80 KDM4E (0.76) ESRRGMEN1KMT2AALPLKDM4E
SCHEMBL28699553 0.79 RAB9A (0.83) ESRRGRAB9ANPC1POLBKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3285119-A1 RADIATION-SENSITIVE COMPOSITION Mitsubishi Gas Chemical Company, Inc. (JP) 2018-02-21 EP disclosed
EP-3279730-A1 RADIATION-SENSITIVE COMPOSITION, AMORPHOUS FILM, AND RESIST PATTERN-FORMATION METHOD Mitsubishi Gas Chemical Company, Inc. (JP) 2018-02-07 EP disclosed
EP-1730103-A1 FORMAMIDE DERIVATIVES USEFUL AS ADRENOCEPTOR Pfizer Limited (GB) 2006-12-13 EP disclosed
WO-2005092840-A1 FORMAMIDE DERIVATIVES USEFUL AS ADRENOCEPTOR PFIZER LIMITED (GB) 2005-10-06 WO disclosed