Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | BCL9 | O00512 | 1/20 | 0.34 |
| ▸ | CTNNB1 | P35222 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.32 |
| ▸ | ESR1 | P03372 | 3/20 | 0.31 |
| ▸ | PDGFRB | P09619 | 1/20 | 0.31 |
| ▸ | PDGFRA | P16234 | 1/20 | 0.31 |
| ▸ | EGFR | P00533 | 1/20 | 0.31 |
| ▸ | ERBB2 | P04626 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | IAPP | P10997 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 2/20 | 0.30 |
| ▸ | MAPT | P10636 | 2/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | PKM | P14618 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Indene SCHEMBL6053279 | 0.94 | KMT2A (0.36) | KMT2AESR1EGFRERBB2HPGD | |
| Indene SCHEMBL6053478 | 0.92 | ELANE (0.37) | KMT2AESR1LMNAMEN1MAPT | |
| Indene SCHEMBL6053432 | 0.87 | MAPT (0.39) | KMT2ALMNAMEN1MAPTALDH1A1 | |
| Indene SCHEMBL6053387 | 0.83 | ELANE (0.37) | CA2 | |
| Indene SCHEMBL15048570 | 0.82 | RELA (0.40) | KMT2AHPGDLMNAMEN1MAPT | |
| Indene SCHEMBL6835844 | 0.80 | MEN1 (0.39) | KMT2AHPGDLMNAMEN1MAPT | |
| Indene SCHEMBL15048613 | 0.80 | CYP2C19 (0.39) | CA2MAPT | |
| Indene SCHEMBL2773974 | 0.79 | — | — | |
| Indene SCHEMBL546792 | 0.77 | CYP2D6 (0.39) | CA2ALDH1A1 | |
| Indene SCHEMBL1972484 | 0.77 | MAPT (0.35) | KMT2ACA2MEN1MAPTALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20060166133-A1 | Negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-07-27 | — | — | US | disclosed |