SCHEMBL6072489

SCHEMBL6072489

COc1cc(C=C(C)C(=O)O)cc(OC)c1O

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PKM P14618 2/20 0.57
PTGS2 P35354 2/20 0.57
PTGS1 P23219 1/20 0.57
CYP3A4 P08684 3/20 0.54
CYP1A2 P05177 2/20 0.54
CYP2C9 P11712 2/20 0.54
CYP2B6 P20813 2/20 0.54
CYP2D6 P10635 1/20 0.54
LMNA P02545 3/20 0.52
CA12 O43570 1/20 0.52
CA1 P00915 1/20 0.52
CA2 P00918 1/20 0.52
CA3 P07451 1/20 0.52
CA4 P22748 1/20 0.52
CA6 P23280 1/20 0.52
CA5A P35218 1/20 0.52
CA7 P43166 1/20 0.52
CA9 Q16790 1/20 0.52
CA14 Q9ULX7 1/20 0.52
CA5B Q9Y2D0 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30812355 1.00 PKM (0.57) PKMPTGS2PTGS1CYP3A4CYP1A2
Methyl Sinapate SCHEMBL887912 0.87 PTGS1 (0.60) PKMPTGS2PTGS1CYP3A4CYP1A2
SCHEMBL28310815 0.86 TUBB1 (0.57) CA1CA2KMT2AKDM4EGAA
SCHEMBL19328294 0.86 TUBB1 (0.57) CA1CA2KMT2AKDM4EGAA
SCHEMBL718131 0.84 PKM (0.59) PKMPTGS2PTGS1CYP3A4CYP1A2
SCHEMBL28630446 0.84 PKM (0.59) PKMPTGS2PTGS1CYP3A4CYP1A2
SCHEMBL30394931 0.83 MAPT (0.58) PKMPTGS2PTGS1CYP3A4CYP1A2
SCHEMBL5770279 0.83 MAPT (0.58) PKMPTGS2PTGS1CYP3A4CYP1A2
SCHEMBL9688979 0.83 MAPT (0.58) PKMPTGS2PTGS1CYP3A4CYP1A2
SCHEMBL2085722 0.81 MAPT (0.69) PKMPTGS2PTGS1CYP3A4CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022145167-A1 ORAL COMPOSITION ライオン株式会社 2022-07-07 WO disclosed
WO-2022102465-A1 ALDEHYDE COMPOSITION 三菱瓦斯化学株式会社 2022-05-19 WO disclosed
WO-2022085670-A1 ALICYCLIC ALCOHOL, ALICYCLIC ALCOHOL COMPOSITION, AND PERFUME COMPOSITION 三菱瓦斯化学株式会社 2022-04-28 WO disclosed
US-7087671-B2 Recycled plastic molded parts for photosensitive materials FUJI PHOTO FILM CO., LTD. (JP) 2006-08-08 US disclosed
US-6783715-B2 CRUSHING; PELLETIZATION; USING AS MOLDING MATERIALS FUJI PHOTO FILM CO., LTD. (JP) 2004-08-31 US disclosed
US-20040092612-A1 Method of recycling mold plastic parts for photosensitive material and a recycled plastic mold parts FUJI PHOTO FILM CO., LTD. (JP) 2004-05-13 US disclosed
US-20020038921-A1 Method of recycling mold plastic parts for photosensitive material and a recycled plastic mold parts FUJI PHOTO FILM CO., LTD. 2002-04-04 US disclosed
EP-1193039-A1 Method of recycling plastic parts for photosensitive material FUJI PHOTO FILM CO., LTD. (JP) 2002-04-03 EP disclosed