Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 4/20 | 0.33 |
| ▸ | CES2 | O00748 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.31 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.31 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15406146 | 0.87 | — | — | |
| SCHEMBL11745741 | 0.86 | CES2 (0.40) | ALDH1A1TSHRCES2HPGD | |
| SCHEMBL9798616 | 0.82 | HSD17B10 (0.35) | — | |
| SCHEMBL49555 | 0.79 | ADRB2 (0.45) | ALDH1A1TSHRHPGDADRB2ADRB1 | |
| SCHEMBL2226549 | 0.78 | — | — | |
| SCHEMBL27877693 | 0.77 | TSHR (0.40) | ALDH1A1TSHRHPGDADRB2ADRB1 | |
| SCHEMBL10640068 | 0.77 | ALDH1A1 (0.37) | ALDH1A1TSHRHPGDADRB2ADRB1 | |
| SCHEMBL29053698 | 0.77 | ADRB2 (0.43) | ALDH1A1TSHRHPGDADRB2ADRB1 | |
| Ethylene Glycol SCHEMBL4948878 | 0.75 | TSHR (0.50) | ALDH1A1TSHRHPGDADRB2ADRB1 | |
| SCHEMBL5698944 | 0.75 | TSHR (0.33) | ALDH1A1TSHRCES2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9946158-B2 | Composition for forming resist underlayer film for nanoimprint | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-04-17 | — | — | US | disclosed |
| EP-2461350-B1 | USE OF A COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT LITHOGRAPHY | NISSAN CHEMICAL IND LTD (JP) | 2018-02-28 | — | — | EP | disclosed |
| US-20150099070-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT | NISSAN CHEMICAL IND LTD (JP) | 2015-04-09 | — | — | US | disclosed |
| EP-2461350-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2012-06-06 | — | — | EP | disclosed |
| US-20120128891-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-05-24 | — | — | US | disclosed |