SCHEMBL6131315

SCHEMBL6131315

CC(C)=C(C)C(=O)OCC(C=O)(C=O)C=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL212681 0.80 CHRM5 (0.31)
SCHEMBL899312 0.76 CYP2C19 (0.32)
SCHEMBL19796057 0.74 HTT (0.46)
SCHEMBL51593 0.72 ALDH1A1 (0.41)
SCHEMBL8318867 0.72
SCHEMBL10357806 0.71 LMNA (0.34)
SCHEMBL1815350 0.69 TSHR (0.31)
SCHEMBL169118 0.68 ALDH1A1 (0.37)
SCHEMBL9700923 0.68 POLB (0.39)
SCHEMBL15476097 0.67 ALDH1A1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20050053862-A1 Photopolymerizable composition and image recording material FUJI PHOTO FILM CO., LTD. 2005-03-10 US disclosed
EP-1510865-A2 Photopolymerizable composition and image recording material Fuji Photo Film Co., Ltd. (JP) 2005-03-02 EP disclosed
US-5712324-A 2-HYDROXY-5-ACRYLOYLOXYPHENYL-2H-BENZOTRIAZOLE CROSSLINKING MONOMER GENERAL ELECTRIC COMPANY (US) 1998-01-27 US disclosed
EP-0736577-A1 UV-curable weather resistant coatings GENERAL ELECTRIC COMPANY (US) 1996-10-09 EP disclosed
EP-0599265-A1 Antibacterial, antifungal compound and its production method Takeda Chemical Industries, Ltd. (JP) 1994-06-01 EP disclosed