SCHEMBL61346

SCHEMBL61346

CN(C)c1ccc(-c2ncccn2)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.56
SMN1; SMN2 Q16637 4/20 0.56
CYP1A2 P05177 9/20 0.53
CLK4 Q9HAZ1 4/20 0.52
ALDH1A1 P00352 8/20 0.50
HSD17B10 Q99714 8/20 0.50
CYP3A4 P08684 8/20 0.50
CYP2D6 P10635 7/20 0.50
CYP2C19 P33261 7/20 0.50
TP53 P04637 6/20 0.50
KDM4E B2RXH2 5/20 0.50
HPGD P15428 4/20 0.50
ALOX15 P16050 4/20 0.50
TSHR P16473 3/20 0.50
SYK P43405 1/20 0.50
USP2 O75604 5/20 0.49
CASP1 P29466 1/20 0.49
CASP7 P55210 1/20 0.49
LMNA P02545 6/20 0.49
CYP2C9 P11712 3/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21019041 0.86 CLK4 (0.52) MAPTSMN1; SMN2CYP1A2CLK4ALDH1A1
SCHEMBL9804732 0.80 MAPT (0.54) MAPTSMN1; SMN2CYP1A2CLK4ALDH1A1
SCHEMBL6685962 0.80 CLK4 (0.64) MAPTSMN1; SMN2CYP1A2CLK4ALDH1A1
SCHEMBL21019388 0.79 SMN1; SMN2 (0.47) MAPTSMN1; SMN2CYP1A2CLK4ALDH1A1
SCHEMBL10601440 0.78 ALDH1A1 (0.58) MAPTSMN1; SMN2CYP1A2CLK4ALDH1A1
SCHEMBL21019111 0.78 CLK4 (0.44) MAPTSMN1; SMN2CYP1A2CLK4ALDH1A1
SCHEMBL16614445 0.77 ADRB2 (0.52) MAPTSMN1; SMN2CYP1A2CLK4ALDH1A1
SCHEMBL16625771 0.77 CLK4 (0.61) MAPTSMN1; SMN2CYP1A2CLK4ALDH1A1
SCHEMBL61036 0.77 CLK4 (0.47) MAPTSMN1; SMN2CLK4ALDH1A1HSD17B10
SCHEMBL21018825 0.77 CLK4 (0.47) MAPTSMN1; SMN2CYP1A2CLK4ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 252 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10254646-B2 Composition sensitive to radiation in electromagnetic spectrum ranges for printing purposes, printing plate comprising said composition, use of said composition and image development process IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) 2019-04-09 US claimed
US-20160026080-A1 COMPOSITION SENSITIVE TO RADIATION IN ELECTROMAGNETIC SPECTRUM RANGES FOR PRINTING PURPOSES, PRINTING PLATE COMPRISING SAID COMPOSITION, USE OF SAID COMPOSITION AND IMAGE DEVLOPMENT PROCESS IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) 2016-01-28 US claimed
EP-2937733-A1 COMPOSITION SENSITIVE TO RADIATION IN ELECTROMAGNETIC SPECTRUM RANGES FOR PRINTING PURPOSES, PRINTING PLATE COMPRISING SAID COMPOSITION, USE OF SAID COMPOSITION AND IMAGE DEVELOPMENT PROCESS IBF - Indústria Brasileira de Filmes S/A (BR) 2015-10-28 EP claimed
EP-4257623-B1 PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE MITSUBISHI GAS CHEMICAL CO (JP) 2026-05-27 EP disclosed
CN-122029488-A Photosensitive coloring composition, cured product, partition wall, organic electroluminescent element, color filter, and image display device 三菱化学株式会社 2026-05-12 CN disclosed
US-12441842-B2 Polyimide resin, photosensitive resin composition, resin film, and electronic device MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-10-14 US disclosed
CN-120029007-A Colored photosensitive resin composition, partition wall, organic electroluminescent element, image display device, and illumination 三菱化学株式会社 2025-05-23 CN disclosed
CN-112313579-B Photosensitive colored resin composition, cured product, image display device, and illumination 三菱化学株式会社 2025-05-13 CN disclosed
WO-2025084407-A1 PHOTOSENSITIVE COLORING COMPOSITION, CURED PRODUCT, PARTITION WALL, ORGANIC ELECTROLUMINESCENT ELEMENT, IMAGE DISPLAY DEVICE, AND PIGMENT DISPERSION LIQUID 三菱ケミカル株式会社 2025-04-24 WO disclosed
WO-2025084352-A1 PHOTOSENSITIVE COLORED COMPOSITION, CURED PRODUCT, PARTITION WALL, ORGANIC ELECTROLUMINESCENT ELEMENT, COLOR FILTER, AND IMAGE DISPLAY DEVICE 三菱ケミカル株式会社 2025-04-24 WO disclosed
WO-2025075166-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, PARTITION WALL, ORGANIC ELECTROLUMINESCENT ELEMENT, AND IMAGE DISPLAY DEVICE 三菱ケミカル株式会社 2025-04-10 WO disclosed
EP-1287986-A1 METHOD AND DEVICE FOR REGENERATIVE PROCESSING AND PRINTING MITSUBISHI CHEMICAL CORPORATION (JP) 2003-03-05 EP disclosed
EP-0758097-B1 POLYMERIZABLE COMPOSITION FOR COLOR FILTER MITSUBISHI CHEM CORP (JP) 2002-08-21 EP disclosed
US-20020018962-A1 Photosensitive lithographic printing plate and method for making a printing plate MITSUBISHI CHEMICAL CORPORATION (JP) 2002-02-14 US disclosed
EP-1148387-A1 Photosensitive lithographic printing plate and method for making the printing plate MITSUBISHI CHEMICAL CORPORATION (JP) 2001-10-24 EP disclosed
US-6048653-A (METH)ACRYLATE COPOLYMER WITH ALICYCLIC(METH)ACRYLOYL GROUP ON THE SIDE CHAIN AND AN UNSATURATED DOUBLE BOND A PHOTOPOLYMERIZABLE INITIATOR AND COLORANT MITSUBISHI CHEMICAL CORPORATION (JP) 2000-04-11 US disclosed
US-5916713-A CONTAINING A (METH)ACRYLATE COPOLYMER MITSUBISHI CHEMICAL CORPORATION (JP) 1999-06-29 US disclosed
EP-0758097-A1 POLYMERIZABLE COMPOSITION FOR COLOR FILTER MITSUBISHI CHEMICAL CORPORATION (JP) 1997-02-12 EP disclosed
US-4594310-A Photopolymerizable composition comprising tertiary aromatic amine and hexaarylbiimazole initiators MITSUBISHI CHEMICAL INDUSTRIES, LTD. (JP) 1986-06-10 US disclosed
EP-0138187-A2 Photopolymerizable composition MITSUBISHI KASEI CORPORATION (JP) 1985-04-24 EP disclosed