Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC1 | Q13547 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | TYR | P14679 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.36 |
| ▸ | PGK1 | P00558 | 1/20 | 0.35 |
| ▸ | PGK2 | P07205 | 1/20 | 0.35 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.35 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.35 |
| ▸ | SLC22A3 | O75751 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | ANPEP | P15144 | 1/20 | 0.35 |
| ▸ | ERAP2 | Q6P179 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 2/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
| ▸ | XBP1 | P17861 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1604232 | 0.91 | ALDH1A1 (0.39) | HDAC1LMNATYRALDH1A1TRPV1 | |
| SCHEMBL8420072 | 0.91 | ALDH1A1 (0.39) | HDAC1LMNATYRALDH1A1TRPV1 | |
| SCHEMBL26103144 | 0.86 | ALDH1A1 (0.36) | HDAC1LMNATYRALDH1A1TRPV1 | |
| SCHEMBL29242227 | 0.79 | HDAC1 (0.42) | HDAC1LMNATYRALDH1A1TRPV1 | |
| SCHEMBL70734 | 0.78 | TSHR (0.52) | HDAC1LMNATYRALDH1A1SLC22A2 | |
| SCHEMBL12762156 | 0.78 | TSHR (0.52) | HDAC1LMNATYRALDH1A1SLC22A2 | |
| Acetic Acid SCHEMBL548374 | 0.77 | HDAC1 (0.44) | HDAC1LMNATYRALDH1A1SLC22A2 | |
| Trifluoroacetic Acid SCHEMBL1002370 | 0.76 | HDAC1 (0.40) | HDAC1LMNATYRALDH1A1TRPV1 | |
| Lithium Ion SCHEMBL16563246 | 0.76 | ALDH1A1 (0.46) | LMNAALDH1A1POLBTSHRMAPT | |
| Water SCHEMBL515827 | 0.76 | TSHR (0.50) | HDAC1LMNATYRALDH1A1SLC22A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4375750-A1 | FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE | ADEKA CORPORATION (JP) | 2024-05-29 | — | — | EP | disclosed |
| WO-2023002928-A1 | FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE | 株式会社ADEKA | 2023-01-26 | — | — | WO | disclosed |
| EP-1035439-B1 | Photosensitive resin composition, color filter, and copolymer resin useful for them | DAINIPPON PRINTING CO LTD (JP) | 2005-06-15 | — | — | EP | disclosed |
| EP-0927726-B1 | PHOTOCATALYTIC COMPOSITION | NIPPON SODA CO (JP) | 2004-11-10 | — | — | EP | disclosed |
| US-6517980-B2 | Copolymer containing hydroxyalkyl meth(acrylate), a (meth)acrylic acid having been partially reacted through carboxy group and hydroxyalkyl(meth)acrylate reacted through hydroxy group with (meth)acryloylalkyl isocyanate compound | DAI NIPPON PRINTING CO., LTD. (JP) | 2003-02-11 | — | — | US | disclosed |
| US-20020172873-A1 | Photosensitive resin composition, color filter, and copolymer resin useful for them | DAI NIPPON PRINTING CO., LTD. (JP) | 2002-11-21 | — | — | US | disclosed |
| US-6410206-B1 | MIXTURE OF (METH)ACRYLIC ACID, ACRYLATED ESTER AND EPOXYCOMPOUND | DAI NIPPON PRINTING CO., LTD. (JP) | 2002-06-25 | — | — | US | disclosed |
| EP-1035439-A2 | Photosensitive resin composition, color filter, and copolymer resin useful for them | DAI NIPPON PRINTING CO., LTD. (JP) | 2000-09-13 | — | — | EP | disclosed |
| US-5925484-A | Black photosensitive resin composition, color filter made by using the same, and a process for the production thereof | TOPPAN PRINTING CO., LTD. (JP) | 1999-07-20 | — | — | US | disclosed |
| EP-0927726-A1 | PHOTOCATALYTIC COMPOSITION | NIPPON SODA CO., LTD. (JP) | 1999-07-07 | — | — | EP | disclosed |
| EP-0854169-A1 | BLACK PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER MADE BY USING THE SAME, AND PROCESS FOR THE PRODUCTION THEREOF | Toppan Printing Co., Ltd. (JP) | 1998-07-22 | — | — | EP | disclosed |
| EP-0594452-B1 | Radiation sensitive resin composition for microlens | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1997-01-15 | — | — | EP | disclosed |
| US-5432039-A | Radiation sensitive quinone diazide and resin composition for microlens | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-07-11 | — | — | US | disclosed |