Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALOX5 | P09917 | 1/20 | 0.43 |
| ▸ | ESR1 | P03372 | 1/20 | 0.41 |
| ▸ | MAOA | P21397 | 1/20 | 0.41 |
| ▸ | UGT1A1 | P22309 | 1/20 | 0.41 |
| ▸ | MAOB | P27338 | 1/20 | 0.41 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.41 |
| ▸ | TYR | P14679 | 5/20 | 0.40 |
| ▸ | TTR | P02766 | 1/20 | 0.39 |
| ▸ | CA12 | O43570 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
| ▸ | CA7 | P43166 | 1/20 | 0.39 |
| ▸ | CA9 | Q16790 | 1/20 | 0.39 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.39 |
| ▸ | USP7 | Q93009 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 2/20 | 0.37 |
| ▸ | MAPT | P10636 | 2/20 | 0.37 |
| ▸ | HTT | P42858 | 2/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30669851 | 1.00 | ALOX5 (0.43) | ALOX5ESR1MAOAUGT1A1MAOB | |
| SCHEMBL10673224 | 0.78 | ANPEP (0.51) | ALOX5ESR1MAOAUGT1A1MAOB | |
| SCHEMBL8705685 | 0.76 | GABRA1 (0.50) | ALOX5ESR1MAOAUGT1A1MAOB | |
| SCHEMBL16196429 | 0.74 | ALOX5 (0.52) | ALOX5ESR1MAOAUGT1A1MAOB | |
| SCHEMBL29623114 | 0.72 | ALOX5 (0.62) | ALOX5ESR1MAOAUGT1A1MAOB | |
| SCHEMBL278749 | 0.72 | ALOX5 (0.62) | ALOX5ESR1MAOAUGT1A1MAOB | |
| SCHEMBL31544912 | 0.72 | TYR (0.47) | ALOX5ESR1MAOAUGT1A1MAOB | |
| SCHEMBL22299503 | 0.71 | ALOX5 (0.50) | ALOX5ESR1MAOAUGT1A1MAOB | |
| SCHEMBL22245944 | 0.71 | GABRA1 (0.44) | ALOX5ESR1MAOAUGT1A1MAOB | |
| SCHEMBL9744348 | 0.71 | AHR (0.48) | CA1CA2GAAHTTMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103907058-A | Nanocomposite positive photosensitive composition and use thereof | AZ ELECTRONIC MATERIALS USA | 2014-07-02 | — | — | CN | disclosed |
| CN-102520583-B | Photoresist compositions comprising acetals and ketals as solvents | AZ ELECTRONIC MATERIALS JAPAN | 2014-05-07 | — | — | CN | disclosed |
| CN-101809502-B | Thick film resists | AZ ELECTRONIC MATERIALS USA | 2014-01-08 | — | — | CN | disclosed |
| EP-1913444-B1 | PHOTORESIST COMPOSITION FOR IMAGING THICK FILMS | AZ ELECTRONIC MATERIALS USA (US) | 2013-01-16 | — | — | EP | disclosed |
| EP-1497697-B1 | PHOTORESIST COMPOSITIONS COMPRISING ACETALS AND KETALS AS SOLVENTS | AZ ELECTRONIC MATERIALS USA (US) | 2012-08-08 | — | — | EP | disclosed |
| EP-1609025-A2 | PHOTORESIST COMPOSITION FOR THE FORMATION OF THICK FILMS | AZ Electronic Materials USA Corp. (US) | 2005-12-28 | — | — | EP | disclosed |
| US-6911293-B2 | Photoresist compositions comprising acetals and ketals as solvents | CLARIANT FINANCE (BVI) LIMITED (VG) | 2005-06-28 | — | — | US | disclosed |
| US-6852465-B2 | Photoresist composition for imaging thick films | CLARIANT INTERNATIONAL LTD. (CH) | 2005-02-08 | — | — | US | disclosed |
| EP-1497697-A2 | PHOTORESIST COMPOSITIONS COMPRISING ACETALS AND KETALS AS SOLVENTS | Clariant International Ltd. (CH) | 2005-01-19 | — | — | EP | disclosed |
| WO-2004083962-A2 | PHOTORESIST COMPOSITION FOR THE FORMATION OF THICK FILMS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-09-30 | — | — | WO | disclosed |
| US-20040185368-A1 | Photoresist composition for imaging thick films | MERCK PATENT GMBH (DE) | 2004-09-23 | — | — | US | disclosed |
| US-6733949-B2 | ACID AND ALKALI ETCHING RESISTANT PROTECTIVE LAYER; IMAGE FORMATION OF MICROELECTRONIC DEVICE | CLARIANT FINANCE (BVI) LIMITED (VG) | 2004-05-11 | — | — | US | disclosed |
| US-20030207195-A1 | NOVOLAK RESIN MIXTURES AND PHOTOSENSITIVE COMPOSITIONS COMPRISING THE SAME | AZ ELECTRONIC MATERIALS USA CORP. | 2003-11-06 | — | — | US | disclosed |
| US-20030194636-A1 | Novolak resin or polyhydroxystyrene; photoactive compound or photoacid generator | MERCK PATENT GMBH (DE) | 2003-10-16 | — | — | US | disclosed |
| WO-2003085455-A2 | PHOTORESIST COMPOSITIONS COMPRISING ACETALS AND KETALS AS SOLVENTS | CLARIANT INTERNATIONAL LTD (CH) | 2003-10-16 | — | — | WO | disclosed |
| EP-1064313-A4 | SELECTED HIGH THERMAL NOVOLAKS AND POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS | ARCH SPEC CHEM INC (US) | 2001-06-13 | — | — | EP | disclosed |
| EP-1064313-A1 | SELECTED HIGH THERMAL NOVOLAKS AND POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2001-01-03 | — | — | EP | disclosed |
| US-5985507-A | PHOTORESISTS WITH THERMAL PROPERTIES | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1999-11-16 | — | — | US | disclosed |
| WO-1999042507-A1 | SELECTED HIGH THERMAL NOVOLAKS AND POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1999-08-26 | — | — | WO | disclosed |
| US-5674657-A | PHENOLIC RESIN COPOLYMER COMPRISING META-CRESOL, PARA-CRESOL AND OTHER PHENOLIC MONOMER SELECTED FROM XYLENOLS, METHOXYPHENOLS; RADIATION SENSITIVITY | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1997-10-07 | — | — | US | disclosed |