SCHEMBL8705685

SCHEMBL8705685

CC(C)c1cc(C(C)C)c(-c2ccc(O)cc2O)c(C(C)C)c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 2/20 0.50
GABRB2 P47870 2/20 0.50
TYR P14679 3/20 0.43
FABP3 P05413 2/20 0.40
FABP4 P15090 2/20 0.40
ANPEP P15144 1/20 0.40
DPP4 P27487 1/20 0.40
FABP5 Q01469 1/20 0.39
ALOX5 P09917 1/20 0.38
TRPA1 O75762 2/20 0.37
PTGS1 P23219 1/20 0.37
CACNA1C Q13936 1/20 0.37
LMNA P02545 1/20 0.37
CHRM1 P11229 1/20 0.37
SLC6A2 P23975 1/20 0.37
ADRA1A P35348 1/20 0.37
HTR2B P41595 1/20 0.37
MAOA P21397 2/20 0.36
MAOB P27338 2/20 0.36
ESR1 P03372 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10673224 0.83 ANPEP (0.51) GABRA1GABRB2TYRANPEPDPP4
SCHEMBL7715672 0.81 GABRA1 (0.50) GABRA1GABRB2TYRFABP3FABP4
SCHEMBL22299503 0.77 ALOX5 (0.50) GABRA1GABRB2TYRALOX5TRPA1
SCHEMBL22245944 0.77 GABRA1 (0.44) GABRA1GABRB2TYRALOX5TRPA1
SCHEMBL978686 0.77 GABRA1 (0.48) GABRA1GABRB2FABP3FABP4FABP5
SCHEMBL10675424 0.76 TRPA1 (0.48) GABRA1GABRB2TYRANPEPDPP4
SCHEMBL6151850 0.76 ALOX5 (0.43) TYRANPEPDPP4ALOX5MAOA
SCHEMBL30669851 0.76 ALOX5 (0.43) TYRANPEPDPP4ALOX5MAOA
SCHEMBL2173349 0.76 GABRA1 (0.68) GABRA1GABRB2TYRFABP3FABP4
SCHEMBL16050488 0.76 GABRA1 (0.52) GABRA1GABRB2TYRFABP3FABP4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117099045-A Negative photosensitive resin composition, cured product, laminate, method for producing cured product, and semiconductor device 富士胶片株式会社 2023-11-21 CN disclosed
EP-0684521-B1 Positive working photosensitive compositions FUJI PHOTO FILM CO LTD (JP) 1998-01-14 EP disclosed