SCHEMBL6211399

SCHEMBL6211399

Cc1ccc(C)c(S(=O)(=O)c2ccc(O)c(S(=O)(=O)c3cc(C)ccc3C)c2)c1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 6/20 0.60
ALDH1A1 P00352 5/20 0.60
PKM P14618 1/20 0.60
L3MBTL1 Q9Y468 1/20 0.49
TSHR P16473 1/20 0.48
KMT2A Q03164 3/20 0.45
MEN1 O00255 2/20 0.45
G6PD P11413 1/20 0.45
POLB P06746 2/20 0.44
USP2 O75604 1/20 0.43
MAPT P10636 1/20 0.43
HTT P42858 1/20 0.43
UBE2N P61088 1/20 0.43
GFER P55789 1/20 0.42
CA12 O43570 1/20 0.42
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42
CA9 Q16790 1/20 0.42
TP53 P04637 1/20 0.41
TDP1 Q9NUW8 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8057518 0.91 L3MBTL1 (0.58) GAAALDH1A1PKML3MBTL1TSHR
SCHEMBL8061992 0.90 L3MBTL1 (0.53) GAAALDH1A1PKML3MBTL1TSHR
SCHEMBL6215926 0.89 L3MBTL1 (0.53) GAAALDH1A1PKML3MBTL1TSHR
SCHEMBL8057546 0.87 GAA (0.56) GAAALDH1A1PKML3MBTL1KMT2A
SCHEMBL9001313 0.84 L3MBTL1 (0.63) GAAALDH1A1PKML3MBTL1KMT2A
SCHEMBL9001242 0.84 TRPA1 (0.52) GAAALDH1A1PKML3MBTL1TSHR
SCHEMBL8527259 0.83 L3MBTL1 (0.61) GAAALDH1A1PKML3MBTL1KMT2A
SCHEMBL656872 0.83 L3MBTL1 (0.61) GAAALDH1A1PKML3MBTL1KMT2A
SCHEMBL8059403 0.82 GAA (0.58) GAAALDH1A1PKML3MBTL1KMT2A
SCHEMBL8768169 0.81 GAA (0.61) GAAALDH1A1PKML3MBTL1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1364805-B1 Heat-sensitive recording material FUJI PHOTO FILM CO LTD (JP) 2005-03-02 EP claimed
US-6730632-B2 ELECTRON-DONATING COLORLESS DYE, 2,4- BIS(PHENYLSULFONYL) PHENOL ELECTRON-ACCEPTING COMPOUND, SULFONIC ACID-MODIFIED POLYVINYL ALCOHOL, ANOTHER MODIFIED POLYVINYL ALCOHOL, LUBRICANT FUJI PHOTO FILM CO., LTD. (JP) 2004-05-04 US claimed
US-20030224935-A1 Heat-sensitive recording material FUJI PHOTO FILM CO., LTD. 2003-12-04 US claimed
EP-1364805-A1 Heat-sensitive recording material Fuji Photo Film Co., Ltd. (JP) 2003-11-26 EP claimed
EP-0706997-B1 Sulfonyl compound and thermal-sensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1998-03-11 EP claimed
EP-0706997-A1 Sulfonyl compound and thermal-sensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1996-04-17 EP claimed
EP-1364805-B1 Heat-sensitive recording material FUJI PHOTO FILM CO LTD (JP) 2005-03-02 EP disclosed
US-6730632-B2 ELECTRON-DONATING COLORLESS DYE, 2,4- BIS(PHENYLSULFONYL) PHENOL ELECTRON-ACCEPTING COMPOUND, SULFONIC ACID-MODIFIED POLYVINYL ALCOHOL, ANOTHER MODIFIED POLYVINYL ALCOHOL, LUBRICANT FUJI PHOTO FILM CO., LTD. (JP) 2004-05-04 US disclosed
US-20030224935-A1 Heat-sensitive recording material FUJI PHOTO FILM CO., LTD. 2003-12-04 US disclosed
EP-1364805-A1 Heat-sensitive recording material Fuji Photo Film Co., Ltd. (JP) 2003-11-26 EP disclosed
JP-2002264529-A HEAT-SENSITIVE RECORDING MEDIUM OJI PAPER CO LTD 2002-09-18 JP disclosed
US-6040470-A DERIVATIVES OF 1-ORGANOETHER,-ESTER OR SULFONE-2,4-BIS-PHENYLSULFONYL)BENZENE IN AN AQUEOUS DEVELOPER SLURRY TO PREVENT DETERIORATION OF DISPERSION DUE TO HYDRATION; HIGHLY SENSITIVE; LESS SURFACE BLUSHING; STORAGE STABILITY OF IMAGE SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 2000-03-21 US disclosed
EP-0791578-B1 Sulfonyl compound and thermalsensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1999-11-10 EP disclosed
US-5840652-A HIGH SENSITIVITY, STORAGE STABILITY SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 1998-11-24 US disclosed
EP-0706997-B1 Sulfonyl compound and thermal-sensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1998-03-11 EP disclosed
US-5705452-A AS DEVELOPER; HIGH SENSITIVITY, LOW BACKGROUND BLUSH DURING STORAGE, RESISTANCE TO HEAT, MOISTURE, PLASTICIZER SANKO HAIHATSU KAGAKU KENKYUSHO (JP) 1998-01-06 US disclosed
EP-0791578-A2 Sulfonyl compound and thermalsensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1997-08-27 EP disclosed
EP-0706997-A1 Sulfonyl compound and thermal-sensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1996-04-17 EP disclosed