SCHEMBL6231295

SCHEMBL6231295

O=C1C=CC(c2ccccc2)OC1c1ccccc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.39
CA2 P00918 1/20 0.39
RAB9A P51151 1/20 0.37
SLC6A3 Q01959 1/20 0.37
KDM4E B2RXH2 3/20 0.36
MAPT P10636 2/20 0.36
POLB P06746 1/20 0.36
KMT2A Q03164 3/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
MEN1 O00255 1/20 0.35
GAA P10253 1/20 0.35
LMNA P02545 2/20 0.33
MAPK1 P28482 2/20 0.33
CYP2C19 P33261 2/20 0.33
TP53 P04637 1/20 0.32
CYP1A2 P05177 1/20 0.32
CYP3A4 P08684 1/20 0.32
HTR2B P41595 1/20 0.32
EPHX1 P07099 2/20 0.32
CYP2C9 P11712 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28696952 0.79 KDM4E (0.39) ALDH1A1CA2RAB9ASLC6A3KDM4E
SCHEMBL7252825 0.69 ALDH1A1 (0.42) ALDH1A1CA2RAB9ASLC6A3KDM4E
SCHEMBL16863671 0.69 LMNA (0.39) ALDH1A1CA2RAB9ASLC6A3KDM4E
SCHEMBL10571447 0.69 CYP2D6 (0.36) SLC6A3MAPTPOLBKMT2ASMN1; SMN2
SCHEMBL5742781 0.65 ALDH1A1 (0.39) ALDH1A1CA2RAB9ASLC6A3KDM4E
SCHEMBL31650964 0.65 ALDH1A1 (0.56) ALDH1A1CA2RAB9ASLC6A3KDM4E
SCHEMBL28452557 0.63 ALDH1A1 (0.54) ALDH1A1CA2RAB9ASLC6A3KDM4E
SCHEMBL983728 0.63 ALDH1A1 (0.54) ALDH1A1CA2RAB9ASLC6A3KDM4E
SCHEMBL28684501 0.62 ALDH1A1 (0.41) ALDH1A1CA2SLC6A3MAPTKMT2A
SCHEMBL9707918 0.62 ALDH1A1 (0.38) ALDH1A1RAB9ASLC6A3KDM4EMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0969966-B1 POSITIVE-WORKING INFRARED RADIATION SENSITIVE COMPOSITION AND PRINTING PLATE AND IMAGING METHOD KODAK POLYCHROME GRAPHICS LLC (US) 2002-07-17 EP claimed
CN-114213380-A Synthetic method of 2, 6-diphenylpyranone compound 西安欧得光电材料有限公司 2022-03-22 CN disclosed
EP-1258349-B1 Method for the preparation of a negative working printing plate AGFA GEVAERT (BE) 2005-04-20 EP disclosed
US-6739260-B2 Method for the preparation of a negative working printing plate AGFA-GEVAERT (BE) 2004-05-25 US disclosed
US-20030005838-A1 Method for the preparation of a negative working printing plate AGFA GRAPHICS NV (BE) 2003-01-09 US disclosed
EP-1258349-A1 Method for the preparation of a negative working printing plate Agfa-Gevaert (BE) 2002-11-20 EP disclosed
EP-0969966-B1 POSITIVE-WORKING INFRARED RADIATION SENSITIVE COMPOSITION AND PRINTING PLATE AND IMAGING METHOD KODAK POLYCHROME GRAPHICS LLC (US) 2002-07-17 EP disclosed
US-6090532-A IMAGEWISE EXPOSING LASER-IMAGEABLE, POSITIVE-WORKING IMAGING LAYER OF PHOTOSENSITIVE ELEMENT WITH INFRARED RADIATION TO PRODUCE AN EXPOSED LAYER COMPRISING IMAGED AREAS; DEVELOPING WITH ALKALINE AQUEOUS DEVELOPER; FINISHING KODAK POLYCHROME GRAPHICS LLC (US) 2000-07-18 US disclosed
US-6083662-A DEVELOPMENT WITH ALKALI METAL SILICATE, THICKENER, PHOSPHATE ESTER AND/OR NONIONIC FLUOROSURFACTANT EASTMAN KODAK COMPANY 2000-07-04 US disclosed
EP-0985166-A1 METHODS OF IMAGING AND PRINTING WITH A POSITIVE-WORKING INFRARED RADIATION SENSITIVE PRINTING PLATE Kodak Polychrome Graphics LLC (US) 2000-03-15 EP disclosed
EP-0969966-A1 POSITIVE-WORKING INFRARED RADIATION SENSITIVE COMPOSITION AND PRINTING PLATE AND IMAGING METHOD Kodak Polychrome Graphics LLC (US) 2000-01-12 EP disclosed
WO-1998054621-A1 METHODS OF IMAGING AND PRINTING WITH A POSITIVE-WORKING INFRARED RADIATION SENSITIVE PRINTING PLATE KODAK POLYCHROME GRAPHICS, L.L.C. (US) 1998-12-03 WO disclosed
WO-1998042507-A1 POSITIVE-WORKING INFRARED RADIATION SENSITIVE COMPOSITION AND PRINTING PLATE AND IMAGING METHOD KODAK POLYCHROME GRAPHICS, L.L.C. (US) 1998-10-01 WO disclosed
EP-0583220-B1 Coated material, its production and use CIBA GEIGY AG (CH) 1996-11-20 EP disclosed
US-5413860-A Coated material, the preparation and use thereof CIBA-GEIGY CORPORATION (US) 1995-05-09 US disclosed
EP-0583220-A1 Coated material, its production and use CIBA-GEIGY AG (CH) 1994-02-16 EP disclosed