SCHEMBL6232528

SCHEMBL6232528

CCc1cccc2c3ccccc3c3ccccc3c12

nearest known ligand 0.48

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 4/20 0.48
GABRB2 P47870 4/20 0.48
ALDH1A1 P00352 3/20 0.44
CYP1A2 P05177 2/20 0.44
THRB P10828 1/20 0.44
HPGD P15428 1/20 0.44
HSD17B10 Q99714 1/20 0.44
NPEPPS P55786 2/20 0.40
ELANE P08246 2/20 0.39
CYP2D6 P10635 1/20 0.39
CYP2C19 P33261 1/20 0.39
MGLL Q99685 1/20 0.39
LMNA P02545 2/20 0.38
TDP1 Q9NUW8 1/20 0.38
HTT P42858 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26324744 0.87 GABRA1 (0.41) GABRA1GABRB2ALDH1A1HPGDNPEPPS
SCHEMBL9770091 0.80 GABRA1 (0.48) GABRA1GABRB2ALDH1A1NPEPPSELANE
SCHEMBL3238496 0.78 GABRA1 (0.57) GABRA1GABRB2ALDH1A1CYP1A2NPEPPS
SCHEMBL12803662 0.77 APOBEC3G (0.46) ALDH1A1CYP1A2THRBHPGDHSD17B10
SCHEMBL2479775 0.76 GABRA1 (0.44) GABRA1GABRB2ALDH1A1HPGDHSD17B10
Ammonia Solution, Strong SCHEMBL28405627 0.76 GABRA1 (0.44) GABRA1GABRB2ALDH1A1NPEPPSELANE
SCHEMBL17299000 0.76 ALDH1A1 (0.38) GABRA1GABRB2ALDH1A1CYP1A2THRB
SCHEMBL170762 0.76 LIPG (0.52)
SCHEMBL30389687 0.76 GABRA1 (0.56) GABRA1GABRB2ALDH1A1NPEPPSLMNA
SCHEMBL9425618 0.76 MAOA (0.48) GABRA1GABRB2ALDH1A1HPGDHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114746392-A Alicyclic acrylate compound, alicyclic epoxy acrylate compound, curable composition, and cured product 引能仕株式会社 2022-07-12 CN disclosed
CN-107735729-B Resist underlayer film forming composition containing epoxy group adduct having long chain alkyl group 日产化学工业株式会社 2021-09-28 CN disclosed
CN-103788881-B Adhesion promoter ROHM AND HAAS ELECTRONIC MATERIALS CO., LTD. (US) 2016-03-16 CN disclosed
CN-105038619-A Adhesion promoter ROHM & HAAS ELECT MAT 2015-11-11 CN disclosed
CN-103788881-A Adhesion promoter ROHM & HAAS ELECT MAT 2014-05-14 CN disclosed
EP-1110988-B1 CATALYST FOR POLYESTER PRODUCTION AND PROCESS FOR PRODUCING POLYESTER WITH THE SAME TEIJIN LTD (JP) 2005-04-27 EP disclosed
CN-1127533-C Catalyst for producing polyester and process for producing polyester using the same TEIJIN LTD (JP) 2003-11-12 CN disclosed
US-6593447-B1 Reaction product of titanium alkoxide, aromatic polycarboxylic acid, and organophosphonic acid TEIJIN LIMITED (JP) 2003-07-15 US disclosed
CN-1103329-C Ethynyl substituted aromatic compounds, their synthesis, polymers and uses thereof DOW CHEMICAL CO (US) 2003-03-19 CN disclosed
CN-1320135-A Catalyst for polyester production and process for process for producing polyester with the same TEIJIN LTD (JP) 2001-10-31 CN disclosed
EP-1110988-A1 CATALYST FOR POLYESTER PRODUCTION AND PROCESS FOR PRODUCING POLYESTER WITH THE SAME TEIJIN LIMITED (JP) 2001-06-27 EP disclosed
CN-1199389-A Ethynyl substituted aromatic compounds, their synthesis, polymers and uses thereof DOW CHEMICAL CO (US) 1998-11-18 CN disclosed
CN-1073137-A The laminating material and the polymkeric substance that contains perfluoro cyclobutane ring that contain the perfluorocyclobutane cyclopolymer DOW CHEMICAL CO (US) 1993-06-16 CN disclosed
EP-0428706-A1 PERFLUOROVINYL COMPOUNDS. DOW CHEMICAL CO (US) 1991-05-29 EP disclosed
WO-1990015043-A2 PERFLUOROVINYL COMPOUNDS THE DOW CHEMICAL COMPANY (US) 1990-12-13 WO disclosed