Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6248784

Cc1ccc(S)cc1.O=S(=O)(O)C(F)(F)F

nearest known ligand 0.42

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 4/20 0.42
CA1 P00915 3/20 0.42
CA5A P35218 2/20 0.42
CA9 Q16790 2/20 0.42
GAA P10253 2/20 0.38
MMP1 P03956 1/20 0.36
MMP2 P08253 1/20 0.36
MMP9 P14780 1/20 0.36
MMP8 P22894 1/20 0.36
MMP13 P45452 1/20 0.36
ALDH1A1 P00352 4/20 0.36
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
CA12 O43570 1/20 0.35
CA3 P07451 1/20 0.35
CA6 P23280 1/20 0.35
CA7 P43166 1/20 0.35
CA5B Q9Y2D0 1/20 0.35
TLR9 Q9NR96 1/20 0.34
HDAC1 Q13547 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL1455936 0.98 CA2 (0.41) CA2CA1CA5ACA9GAA
Biphenyl SCHEMBL1993781 0.89 PTPN1 (0.44) CA2CA1CA5ACA9MMP1
P-Xylene SCHEMBL2990077 0.89 CA2 (0.50) CA2CA1CA5ACA9GAA
SCHEMBL27764034 0.82 CA1 (0.46) CA2CA1CA5ACA9GAA
SCHEMBL6743597 0.82 CA2 (0.36) CA2CA1CA5ACA9GAA
Trifluoromethanesulfonic Acid SCHEMBL3684082 0.81 CA1 (0.38) CA2CA1CA9MMP1MMP2
Trifluoromethanesulfonic Acid SCHEMBL28173684 0.81 LMNA (0.43) CA2CA1CA5ACA9ALDH1A1
P-Cresol SCHEMBL28538740 0.81 ACHE (0.56) CA2CA1CA5ACA9GAA
SCHEMBL29670948 0.81 CA2 (0.37) CA2CA1CA5ACA9GAA
SCHEMBL29670941 0.81 CA2 (0.35) CA2CA1CA5ACA9GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2326744-B1 METAL COMPOSITIONS AND METHODS OF MAKING SAME PRYOG LLC (US) 2022-06-01 EP claimed
EP-2691367-A1 ELECTROPHILIC ALKYLATING REAGENTS, THEIR PREPARATION AND USE Hovione Inter Ltd. (CH) 2014-02-05 EP claimed
WO-2012131286-A1 ELECTROPHILIC ALKYLATING REAGENTS, THEIR PREPARATION AND USE HOVIONE INTER. LTD (CH) 2012-10-04 WO claimed
CN-117957640-A Substrate processing apparatus and substrate processing method 株式会社斯库林集团 2024-04-30 CN disclosed
US-9975830-B2 Compound containing modified phenolic hydroxy group, method for producing compound containing modified phenolic hydroxy group, photosensitive composition, resist material, and resist coating film DIC CORPORATION (JP) 2018-05-22 US disclosed
US-20170066703-A1 COMPOUND CONTAINING MODIFIED PHENOLIC HYDROXY GROUP, METHOD FOR PRODUCING COMPOUND CONTAINING MODIFIED PHENOLIC HYDROXY GROUP, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL, AND RESIST COATING FILM DIC CORPORATION (JP) 2017-03-09 US disclosed
EP-2691367-A1 ELECTROPHILIC ALKYLATING REAGENTS, THEIR PREPARATION AND USE Hovione Inter Ltd. (CH) 2014-02-05 EP disclosed
WO-2012131286-A1 ELECTROPHILIC ALKYLATING REAGENTS, THEIR PREPARATION AND USE HOVIONE INTER. LTD (CH) 2012-10-04 WO disclosed
EP-0989458-B1 Chemically amplified positive photoresist composition KOREA KUMHO PETROCHEM CO LTD (KR) 2005-08-31 EP disclosed
EP-1059314-B1 A resist composition WAKO PURE CHEM IND LTD (JP) 2004-12-22 EP disclosed
EP-1059314-A1 A resist composition Wako Pure Chemical Industries, Ltd. (JP) 2000-12-13 EP disclosed
EP-0989458-A2 Chemically amplified positive photoresist composition Korea Kumho Petrochemical Co. Ltd. (KR) 2000-03-29 EP disclosed
EP-0989462-A1 Resist polymer and chemical amplified resist composition containing the same Korea Kumho Petrochemical Co. Ltd. (KR) 2000-03-29 EP disclosed
US-5679496-A CONTAINING SULFONIUM SALT HAVING TERT-BUTOXYCARBONYLMETHOXY GROUP(S) AS ACID LABILE GROUPS; SENSITIVITY, RESOLUTION, ETCH AND HEAT RESISTANCE SHIN-ETSU CHEMICAL CO., LTD. (JP) 1997-10-21 US disclosed
US-5380923-A Semiconductors MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1995-01-10 US disclosed
WO-1994025507-A1 POLYMERIC SULFONIUM SALTS AND METHOD OF PREPARATION THEREOF MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1994-11-10 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170066703-A1 COMPOUND CONTAINING MODIFIED PHENOLIC HYDROXY GROUP, METHOD FOR PRODUCING COMPOUND CONTAINING MODIFIED PHENOLIC HYDROXY GROUP, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL, AND RESIST COATING FILM PAH, TYR, HACL2 CA2 3888/4885CA1 4756/4885CA5A 4605/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.