SCHEMBL6282646

SCHEMBL6282646

Cc1cc(C)c(S(OS(=O)(=O)c2ccc(Cl)cc2)(c2ccccc2)c2ccccc2)c(C)c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FFAR4 Q5NUL3 2/20 0.46
TDP1 Q9NUW8 2/20 0.45
ALDH1A1 P00352 3/20 0.42
HPGD P15428 3/20 0.42
KDM4E B2RXH2 2/20 0.42
CYP2C19 P33261 2/20 0.42
GAA P10253 1/20 0.42
CYP2C9 P11712 1/20 0.42
RAPGEF4 Q8WZA2 4/20 0.41
L3MBTL1 Q9Y468 5/20 0.40
HTT P42858 2/20 0.40
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
CYP1A2 P05177 1/20 0.36
CYP3A4 P08684 1/20 0.36
FLT1 P17948 1/20 0.36
FLT4 P35916 1/20 0.36
KDR P35968 1/20 0.36
NPSR1 Q6W5P4 2/20 0.36
LMNA P02545 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL58786 0.91 FFAR4 (0.47) FFAR4TDP1ALDH1A1HPGDKDM4E
SCHEMBL2679026 0.90 RAPGEF4 (0.51) FFAR4ALDH1A1HPGDKDM4ECYP2C19
SCHEMBL3190660 0.86 FFAR4 (0.46) FFAR4RAPGEF4L3MBTL1MEN1KMT2A
SCHEMBL5408918 0.84 KDM4E (0.42) FFAR4TDP1ALDH1A1HPGDKDM4E
SCHEMBL3136307 0.84 TDP1 (0.51) TDP1ALDH1A1KDM4ECYP2C19GAA
SCHEMBL3135353 0.84 TDP1 (0.51) TDP1ALDH1A1KDM4ECYP2C19GAA
SCHEMBL547726 0.83 CYP1A2 (0.42) FFAR4ALDH1A1CYP2C19GAARAPGEF4
SCHEMBL5165470 0.82 TDP1 (0.59) TDP1ALDH1A1KDM4EGAAL3MBTL1
SCHEMBL5398449 0.81 FFAR4 (0.39) FFAR4ALDH1A1GAARAPGEF4L3MBTL1
SCHEMBL4581355 0.81 FFAR4 (0.49) FFAR4TDP1ALDH1A1HPGDKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6949329-B2 Pattern formation method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2005-09-27 US disclosed
EP-1406123-A1 RESIST COMPOSITIONS Wako Pure Chemical Industries, Ltd. (JP) 2004-04-07 EP disclosed
US-20030017425-A1 Pattern formation method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2003-01-23 US disclosed