SCHEMBL4581355

SCHEMBL4581355

Cc1cc(C)c(S(=O)(=O)OS(c2ccccc2)(c2ccccc2)c2ccccc2)c(C)c1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FFAR4 Q5NUL3 1/20 0.49
RAPGEF4 Q8WZA2 5/20 0.44
L3MBTL1 Q9Y468 3/20 0.42
LMNA P02545 2/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
METAP2 P50579 1/20 0.41
MCOLN3 Q8TDD5 1/20 0.41
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
HTT P42858 2/20 0.40
MAPT P10636 2/20 0.39
NPSR1 Q6W5P4 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
APAF1 O14727 1/20 0.39
NR3C1 P04150 2/20 0.38
PGR P06401 1/20 0.38
NR3C2 P08235 1/20 0.38
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
MMP1 P03956 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL58786 0.88 FFAR4 (0.47) FFAR4RAPGEF4L3MBTL1LMNASMN1; SMN2
SCHEMBL4670261 0.86 RAPGEF4 (0.43) FFAR4RAPGEF4L3MBTL1LMNASMN1; SMN2
SCHEMBL3140005 0.85 FFAR4 (0.42) FFAR4RAPGEF4L3MBTL1LMNASMN1; SMN2
SCHEMBL2679026 0.84 RAPGEF4 (0.51) FFAR4RAPGEF4L3MBTL1LMNASMN1; SMN2
SCHEMBL3181566 0.84 KMT2A (0.41) FFAR4RAPGEF4L3MBTL1LMNASMN1; SMN2
SCHEMBL3199775 0.82 CYP1A2 (0.42) FFAR4RAPGEF4L3MBTL1LMNASMN1; SMN2
SCHEMBL5066022 0.81 FFAR4 (0.47) FFAR4RAPGEF4L3MBTL1LMNASMN1; SMN2
SCHEMBL3201689 0.81 CYP1A2 (0.44) FFAR4RAPGEF4L3MBTL1LMNAMETAP2
SCHEMBL3190660 0.81 FFAR4 (0.46) FFAR4RAPGEF4L3MBTL1LMNASMN1; SMN2
SCHEMBL6282646 0.81 FFAR4 (0.46) FFAR4RAPGEF4L3MBTL1LMNAMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7435527-B2 Mixture of acid generator and resin insoluble in alkaline developer and another acid decomposable compound FUJIFILM CORPORATION (JP) 2008-10-14 US disclosed
US-20040253538-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2004-12-16 US disclosed