SCHEMBL6294074

SCHEMBL6294074

O=c1oc(=O)c2ccc1s2

nearest known ligand 0.37

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CA2 P00918 1/20 0.37
ALPI P09923 1/20 0.37
MAPT P10636 1/20 0.37
ALPG P10696 1/20 0.37
HPGD P15428 1/20 0.37
MAOA P21397 1/20 0.37
MAOB P27338 1/20 0.37
HTT P42858 1/20 0.37
CA12 O43570 1/20 0.33
CA9 Q16790 1/20 0.33
GPR3 P46089 1/20 0.30
KDM4E B2RXH2 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL390961 0.80
SCHEMBL15695591 0.71 PDE2A (0.34) CA2ALPIMAPTALPGHPGD
SCHEMBL10017613 0.64 KDM4E (0.36) MAPTKDM4E
SCHEMBL13279077 0.62
SCHEMBL110031 0.62 MCL1 (0.38) CA2MAPTHPGDMAOBCA12
SCHEMBL20963080 0.62 ALDH1A1 (0.46) ALPIMAPTHPGDMAOAKDM4E
SCHEMBL8520516 0.60 MCL1 (0.36) CA2MAPTHPGDMAOBCA12
SCHEMBL7185921 0.60 SMN1; SMN2 (0.39) CA2MAPTHPGDMAOAMAOB
SCHEMBL23704523 0.60 MAOA (0.44) CA2ALPIMAPTALPGHPGD
SCHEMBL20963057 0.58 ELANE (0.54) MAPTHPGDMAOAKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109790292-B Process for preparing polybenzazole polymer (P) 巴斯夫欧洲公司 2022-05-31 CN claimed
CN-109790292-A Process for preparing polybenzazole polymer (P) 巴斯夫欧洲公司 2019-05-21 CN claimed
CN-111836849-B Process for producing fibers, films and moldings of polybenzazole polymer (P) 巴斯夫欧洲公司 2023-04-07 CN disclosed
EP-3512905-B1 METHOD FOR PRODUCING A POLYBENZAZOL POLYMER (P) BASF SE (DE) 2022-08-24 EP disclosed
CN-109790292-B Process for preparing polybenzazole polymer (P) 巴斯夫欧洲公司 2022-05-31 CN disclosed
EP-3762447-A1 METHOD FOR PRODUCING FIBRES, FILMS AND MOULDED BODIES OF A POLYBENZAZOLE POLYMER (P) BASF SE (DE) 2021-01-13 EP disclosed
US-20200407508-A1 METHOD FOR PRODUCING FIBERS, FILMS AND MOLDINGS OF A POLYBENZAZOLE POLYMER (P) BASF SE (DE) 2020-12-31 US disclosed
CN-111836849-A Process for producing fibers, films and moldings of polybenzazole polymer (P) 巴斯夫欧洲公司 2020-10-27 CN disclosed
WO-2019170529-A1 METHOD FOR PRODUCING FIBRES, FILMS AND MOULDED BODIES OF A POLYBENZAZOLE POLYMER (P) BASF SE (DE) 2019-09-12 WO disclosed
CN-109790292-A Process for preparing polybenzazole polymer (P) 巴斯夫欧洲公司 2019-05-21 CN disclosed
US-6911291-B2 Recording material having a negative-working, radiation-sensitive layer which comprises additives for promoting developability AGFA-GEVAERT (BE) 2005-06-28 US disclosed
EP-0752430-A2 Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates SUN CHEMICAL CORPORATION (US) 1997-01-08 EP disclosed
EP-0749045-A2 Photosensitive compositions and their use in lithographic plates SUN CHEMICAL CORPORATION (US) 1996-12-18 EP disclosed
US-5238777-A Resin containing light sensitive azide groups, further reacted with anhydride material to generate carboxylic and sulfonic acid groups; lithography DUPONT (U.K.) LIMITED (GB) 1993-08-24 US disclosed
US-5143813-A Lithographic printing plates, aromatic-aldehyde resin containing diazonium groups HOECHST AKTIENGESELLSCHAFT (DE) 1992-09-01 US disclosed
US-5126504-A Easily strippable HOECHST AKTIENGESELLSCHAFT (DE) 1992-06-30 US disclosed
US-5045429-A Light-sensitive photopolymerizable and diazonium resin containing composition and recording material including reaction product of anhydride with carboxylic acid and vinyl alcohol HOECHST AKTIENGESELLSCHAFT (DE) 1991-09-03 US disclosed
EP-0412731-A1 Improvements in or relating to bakeable aqueous photopolymers Du Pont (UK) Limited (GB) 1991-02-13 EP disclosed
US-4956261-A Photosensitive diazo and photopolymerizable recording material with a photosensitive diazo intermediate layer HOECHST AKTIENGESELLSCHAFT (DE) 1990-09-11 US disclosed
US-4631245-A POLYVINYL ACETAL-ACID ANHYDRIDE BINDERS, COATINGS FOR PHOTORESISTS AND PRINTING PLATES HOECHST AKTIENGESELLSCHAFT (DE) 1986-12-23 US disclosed