Sulfuric Acid

Sulfuric Acid

SCHEMBL631032

C=C(C)C(=O)OCC.CN(C)C.O=S(=O)(O)O

nearest known ligand 0.50

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Known targets — ChEMBL curated mechanism

ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3CALCRLCHRM1CHRM2CHRM3F2RMAOAMAOBMAP2K1MAP2K2NTRK1NTRK2NTRK3OPRD1OPRK1OPRM1P2RY12PKLRSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASLC18A2SLC6A2SLC6A3TLR7TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8dacAdacBdacCfolAftsImrcAmrcBmrdApolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmB1rpmB2rpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmHrpmIrpmJrpmJ2rpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsR1rpsR2rpsSrpsTrpsUrpsZykgMykgO

The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.50
TSHR P16473 4/20 0.44
ALDH1A1 P00352 7/20 0.42
GLO1 Q04760 1/20 0.39
LMNA P02545 1/20 0.39
HSD17B10 Q99714 1/20 0.39
GAA P10253 2/20 0.38
MGAM O43451 1/20 0.38
SI P14410 1/20 0.38
MGAM2 Q2M2H8 1/20 0.38
CYP2C9 P11712 1/20 0.37
MAPT P10636 2/20 0.36
NPSR1 Q6W5P4 1/20 0.35
ALOX15 P16050 1/20 0.33
EGLN1 Q9GZT9 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trimethylammonium SCHEMBL25283249 0.94 THRB (0.48) THRBTSHRALDH1A1GLO1LMNA
Sulfuric Acid SCHEMBL1169601 0.94 THRB (0.55) THRBTSHRALDH1A1GLO1LMNA
N,N-Dimethylethanaminium SCHEMBL8023985 0.92 THRB (0.47) THRBTSHRALDH1A1GLO1LMNA
N,N-Dimethylethanaminium SCHEMBL8023992 0.92 THRB (0.47) THRBTSHRALDH1A1GLO1LMNA
N,N-Dimethylethanaminium SCHEMBL7866527 0.92 THRB (0.47) THRBTSHRALDH1A1GLO1LMNA
Sulfuric Acid SCHEMBL1943128 0.92 THRB (0.53) THRBTSHRALDH1A1GLO1LMNA
Sulfuric Acid SCHEMBL1943127 0.92 THRB (0.53) THRBTSHRALDH1A1GLO1LMNA
Trimethylammonium SCHEMBL421649 0.92 THRB (0.57) THRBTSHRALDH1A1GLO1LMNA
Trimethylammonium SCHEMBL361090 0.91 THRB (0.46) THRBTSHRALDH1A1GLO1LMNA
Sulfuric Acid SCHEMBL865346 0.91 THRB (0.46) THRBTSHRALDH1A1GLO1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8357724-B2 Method for controlling the stability or the droplets size of simple water-in-oil emulsions, and stabilized simple water-in-oil emulsions RHODIA CHIMIE (FR) 2013-01-22 US claimed
EP-2209824-B1 HIGH DEFINITION PRINTING WITH WATERBORNE INKS ON NON-POROUS SUBSTRATES RHODIA (US) 2012-08-08 EP claimed
US-8025918-B2 High definition printing with waterborne inks on non-porous substrates RHODIA, INC. (US) 2011-09-27 US claimed
EP-2209824-A2 HIGH DEFINITION PRINTING WITH WATERBORNE INKS ON NON-POROUS SUBSTRATES Rhodia, Inc. (US) 2010-07-28 EP claimed
US-7737237-B2 Controlled structure copolymer comprising an amphoteric or zwitterionic part PHODIA CHIMIE (FR) 2010-06-15 US claimed
WO-2009065004-A2 HIGH DEFINITION PRINTING WITH WATERBORNE INKS ON NON-POROUS SUBSTRATES RHODIA, INC. (US) 2009-05-22 WO claimed
US-20090130295-A1 High Definition Printing With Waterborne Inks on Non-Porous Substrates RHODIA OPERATIONS (FR) 2009-05-21 US claimed
EP-1383813-B1 USE OF AMPHILIC BLOCK COPOLYMERS IN ORDER TO INCREASE THE WATER AFFINITY OF LOW-ENERGY SURFACES RHODIA CHIMIE SA (FR) 2009-04-01 EP claimed
US-20040082494-A1 Use of amphilic block copolymers in order to increase the water affinity of low-energy surfaces RHODIA CHIMIE (FR) 2004-04-29 US claimed
US-20040071871-A1 Use of an amphiphilic block copolymers as adhesion promoters of film-forming aqueous compositions on a low-energy surface RHODIA CHIMIE (FR) 2004-04-15 US claimed
EP-2419784-B1 CO-ASSEMBLY METHOD AND CO-ASSEMBLED STRUCTURES MADE THEREBY RHODIA OPERATIONS (FR) 2021-03-24 EP disclosed
EP-2190793-B1 MODIFIED SURFACES COMPRISING NANOSCALE INORGANIC OXIDE PARTICLES SOLVAY USA INC (US) 2020-11-04 EP disclosed
WO-2020020717-A1 A MULTI-BLOCK COPOLYMER, PREPARATION PROCESS AND COMPOSITION THEREOF BASF SE (DE) 2020-01-30 WO disclosed
US-20170253685-A1 BLOCK COPOLYMERS THAT CAN BE USED AS PLASTICISERS STARCIN HOLDING FRANCE (FR) 2017-09-07 US disclosed
CN-102356346-B Co-assembly method and co-assembly structure prepared by same RHODIA OPERATIONS 2015-01-14 CN disclosed
US-20030207052-A1 PRINT MEDIA PRODUCTS FOR GENERATING HIGH QUALITY IMAGES AND METHODS FOR MAKING THE SAME HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 2003-11-06 US disclosed
US-6559233-B2 For use in oil fields or gas deposits, detergence, cosmetics RHODIA CHIMIE (FR) 2003-05-06 US disclosed
US-20030049417-A1 Print media products for generating high quality, water-fast images and methods for making the same HEWLETT-PACKARD DEVELOPMENT COMPANY L.P. 2003-03-13 US disclosed
EP-1288013-A2 Print media products for generating high quality, water-fast images and methods for making the same Hewlett-Packard Company (US) 2003-03-05 EP disclosed
US-20030023000-A1 Composition comprising a copolymer at least two charged blocks and type of opposite charge RHODIA CHIMIE (FR) 2003-01-30 US disclosed