Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.37 |
| ▸ | TAS1R3 | Q7RTX0 | 3/20 | 0.36 |
| ▸ | TAS1R1 | Q7RTX1 | 3/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | CES1 | P23141 | 2/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | CYP1A1 | P04798 | 3/20 | 0.31 |
| ▸ | CYP1B1 | Q16678 | 3/20 | 0.31 |
| ▸ | P4HB | P07237 | 1/20 | 0.31 |
| ▸ | MLYCD | O95822 | 3/20 | 0.31 |
| ▸ | CES2 | O00748 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL942133 | 0.81 | CES1 (0.54) | ALDH1A1TAS1R3TAS1R1TDP1CES1 | |
| SCHEMBL11982629 | 0.76 | CA2 (0.63) | ALDH1A1CA2TDP1CES1LMNA | |
| SCHEMBL498072 | 0.75 | CES1 (0.61) | ALDH1A1CA2TDP1CES1LMNA | |
| SCHEMBL942656 | 0.75 | CA1 (0.38) | ALDH1A1CA2TDP1CES1LMNA | |
| SCHEMBL14962768 | 0.74 | TDP1 (0.43) | ALDH1A1CA2TAS1R3TAS1R1TDP1 | |
| SCHEMBL569646 | 0.74 | TDP1 (0.47) | ALDH1A1CA2TAS1R3TAS1R1TDP1 | |
| SCHEMBL23419327 | 0.73 | ALDH1A1 (0.46) | ALDH1A1TAS1R3TAS1R1TDP1MAPT | |
| SCHEMBL10001141 | 0.73 | ALDH1A1 (0.46) | ALDH1A1CA2TAS1R3TAS1R1TDP1 | |
| SCHEMBL570263 | 0.72 | TDP1 (0.46) | ALDH1A1CA2TAS1R3TAS1R1TDP1 | |
| SCHEMBL803878 | 0.72 | ALDH1A1 (0.44) | ALDH1A1CA2TAS1R3TAS1R1TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6872504-B2 | High sensitivity X-ray photoresist | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2005-03-29 | — | — | US | claimed |
| US-6794109-B2 | POLYMER CONTAINING A FLUORINATED STYRENE COPOLYMER | MASSACHUSETTS INSTITUTE OF TECHNOLOGY | 2004-09-21 | — | — | US | claimed |
| US-20040110091-A1 | High sensitivity X-ray photoresist | MASS INSTITUTE OF TECHNOLOGY (MIT) | 2004-06-10 | — | — | US | claimed |
| US-20020160297-A1 | Low abosorbing resists for 157 nm lithography | AIR FORCE, UNITED STATES | 2002-10-31 | — | — | US | claimed |
| WO-2002069043-A2 | LOW ABSORBING RESISTS FOR 157 NM LITHOGRAPHY | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2002-09-06 | — | — | WO | claimed |
| US-6872504-B2 | High sensitivity X-ray photoresist | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2005-03-29 | — | — | US | disclosed |
| US-6794109-B2 | POLYMER CONTAINING A FLUORINATED STYRENE COPOLYMER | MASSACHUSETTS INSTITUTE OF TECHNOLOGY | 2004-09-21 | — | — | US | disclosed |
| US-20040110091-A1 | High sensitivity X-ray photoresist | MASS INSTITUTE OF TECHNOLOGY (MIT) | 2004-06-10 | — | — | US | disclosed |
| WO-2002091084-A2 | RESIST WITH REDUCED LINE EDGE ROUGHNESS | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2002-11-14 | — | — | WO | disclosed |
| US-20020160297-A1 | Low abosorbing resists for 157 nm lithography | AIR FORCE, UNITED STATES | 2002-10-31 | — | — | US | disclosed |
| WO-2002069043-A2 | LOW ABSORBING RESISTS FOR 157 NM LITHOGRAPHY | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2002-09-06 | — | — | WO | disclosed |