SCHEMBL6318871

SCHEMBL6318871

O=C(/C=C\C(=O)OC(=O)C1CC2C=CC1C2)OC(=O)C1CC2C=CC1C2

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.49
LMNA P02545 2/20 0.49
ALDH1A1 P00352 9/20 0.40
KMT2A Q03164 3/20 0.39
RAB9A P51151 1/20 0.39
POLB P06746 2/20 0.38
HSD17B10 Q99714 2/20 0.38
APEX1 P27695 1/20 0.38
RECQL P46063 1/20 0.38
BLM P54132 1/20 0.38
ESR2 Q92731 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
HPGD P15428 1/20 0.38
MEN1 O00255 1/20 0.33
ALOX15 P16050 1/20 0.33
TSHR P16473 1/20 0.33
HTT P42858 1/20 0.33
THRB P10828 1/20 0.33
MAPK1 P28482 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acrylic Acid SCHEMBL3841669 0.91 KDM4E (0.41) KDM4ELMNAALDH1A1KMT2ARAB9A
Methacrylic Acid SCHEMBL3845692 0.88 KDM4E (0.40) KDM4ELMNAALDH1A1KMT2ARAB9A
SCHEMBL2776167 0.87 LMNA (0.57) KDM4ELMNAALDH1A1KMT2ARAB9A
SCHEMBL14378676 0.87 LMNA (0.57) KDM4ELMNAALDH1A1KMT2ARAB9A
SCHEMBL14216898 0.86 KDM4E (0.46) KDM4ELMNAALDH1A1KMT2ARAB9A
SCHEMBL28171681 0.82 HSD11B1 (0.43) KDM4ELMNAALDH1A1KMT2ARAB9A
SCHEMBL16001621 0.80 LMNA (0.50) KDM4ELMNAALDH1A1KMT2ARAB9A
SCHEMBL7891625 0.80 LMNA (0.50) KDM4ELMNAALDH1A1KMT2ARAB9A
SCHEMBL2201028 0.79 LMNA (0.57) KDM4ELMNAALDH1A1KMT2ARAB9A
SCHEMBL10036791 0.76 LMNA (0.50) KDM4ELMNAALDH1A1KMT2ARAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020031721-A1 Photoresist composition for top-surface imaging processes by silylation HYNIX SEMICONDUCTOR INC. (KR) 2002-03-14 US claimed
US-6841488-B2 Pattern formation method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2005-01-11 US disclosed
US-6784268-B2 POLAR ALKYLOXYALKYL-SUBSTITUTED NORBORN-2-ENES, PENTALENES, 4,7-METHANOINDENES HAVING A ACID LABILE GROUP AS MONOMERS FOR HIGH-MOLECULAR WEIGHT POLYMERS; SUBSTRATE ADHESION; RIGIDITY; RESOLUTION AND ETCH RESISTANE; MICROPATTERNS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-08-31 US disclosed
US-20040013973-A1 Ether, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO,. LTD. (JP) 2004-01-22 US disclosed
US-6630281-B2 Forming positive pattern HYNIX SEMICONDUCTOR INC. (KR) 2003-10-07 US disclosed
US-6624335-B2 Unsaturated ether compound; photopolymerization SHIN ETSU CHEMICAL CO., LTD. (JP) 2003-09-23 US disclosed
US-20030082926-A1 Pattern formation method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2003-05-01 US disclosed
US-20020161150-A1 Ether, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-10-31 US disclosed
US-20020031721-A1 Photoresist composition for top-surface imaging processes by silylation HYNIX SEMICONDUCTOR INC. (KR) 2002-03-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020161150-A1 Ether, polymer, resist composition and patterning process ARCN1, RER1, GAR1 KDM4E 132/4885LMNA 532/4885ALDH1A1 1186/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.