SCHEMBL632001

SCHEMBL632001

COCC(COC(=O)c1ccccc1C(=O)O)OC

nearest known ligand 0.57

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.54
TSHR P16473 7/20 0.54
TDP1 Q9NUW8 2/20 0.45
L3MBTL1 Q9Y468 2/20 0.45
CYP3A4 P08684 3/20 0.44
CA2 P00918 1/20 0.44
MAPK1 P28482 3/20 0.44
TP53 P04637 2/20 0.44
LMNA P02545 1/20 0.43
PRSS1 P07477 1/20 0.43
PRSS2 P07478 1/20 0.43
PRSS3 P35030 1/20 0.43
ALOX15 P16050 1/20 0.42
KDM4E B2RXH2 1/20 0.41
HPGD P15428 1/20 0.41
HSD17B10 Q99714 1/20 0.41
KMT2A Q03164 1/20 0.40
USP2 O75604 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29396329 0.83 ALDH1A1 (0.59) ALDH1A1TSHRTDP1L3MBTL1CYP3A4
SCHEMBL8036928 0.83 ALDH1A1 (0.59) ALDH1A1TSHRTDP1L3MBTL1CYP3A4
SCHEMBL9935576 0.83 ALDH1A1 (0.59) ALDH1A1TSHRTDP1MAPK1LMNA
SCHEMBL226501 0.79 ALDH1A1 (0.86) ALDH1A1TSHRTDP1L3MBTL1CYP3A4
SCHEMBL186286 0.79 TSHR (0.86) ALDH1A1TSHRTDP1L3MBTL1CYP3A4
Phthalic Acid SCHEMBL27873885 0.79 ALDH1A1 (0.86) ALDH1A1TSHRTDP1L3MBTL1CYP3A4
Phthalic Acid SCHEMBL29007201 0.79 ALDH1A1 (0.86) ALDH1A1TSHRTDP1L3MBTL1CYP3A4
SCHEMBL29601593 0.79 ALDH1A1 (0.86) ALDH1A1TSHRTDP1L3MBTL1CYP3A4
Phthalic Acid SCHEMBL19667985 0.79 ALDH1A1 (0.86) ALDH1A1TSHRTDP1L3MBTL1CYP3A4
Phthalic Acid SCHEMBL29285130 0.79 ALDH1A1 (0.86) ALDH1A1TSHRTDP1L3MBTL1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107207456-B Latent acids and their use 巴斯夫欧洲公司 2021-05-04 CN disclosed
EP-3253735-B1 LATENT ACIDS AND THEIR USE BASF SE (DE) 2021-03-31 EP disclosed
US-10133175-B2 Photosensitive resin composition, cured product and method for producing same, method for producing resin pattern, cured film, liquid crystal display device, organic el display device, infrared cut filter, and solid-state imaging device FUJIFILM CORPORATION (JP) 2018-11-20 US disclosed
US-9994538-B2 Latent acids and their use BASF SE (DE) 2018-06-12 US disclosed
US-9964848-B2 Positive photosensitive resin composition and cured film forming method using the same FUJIFILM CORPORATION (JP) 2018-05-08 US disclosed
US-20180009775-A1 LATENT ACIDS AND THEIR USE BASF SE (DE) 2018-01-11 US disclosed
EP-2420890-B1 Positive photosensitive resin composition, method for forming cured film and liquid crystal display device FUJIFILM CORP (JP) 2017-03-01 EP disclosed
EP-2613198-B1 PHOTOSENSITIVE RESIN COMPOSITION, OXIME SULFONATE COMPOUND, METHOD FOR FORMING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE FUJIFILM CORP (JP) 2016-12-28 EP disclosed
US-20160320529-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, METHOD FOR PRODUCING RESIN PATTERN, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, ORGANIC EL DISPLAY DEVICE, INFRARED CUT FILTER, AND SOLID-STATE IMAGING DEVICE FUJIFILM CORPORATION (JP) 2016-11-03 US disclosed
WO-2016124493-A1 LATENT ACIDS AND THEIR USE BASF SE (DE) 2016-08-11 WO disclosed
EP-2420890-A1 Positive photosensitive resin composition, method for forming cured film, cured film, organic el display device and liquid crystal display device Fujifilm Corporation (JP) 2012-02-22 EP disclosed
US-20110229661-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM FORMING METHOD USING THE SAME C/O FUJIFILM CORPORATION (JP) 2011-09-22 US disclosed
US-20110177302-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING CURED FILM FROM THE SAME FUJIFILM CORPORATION (JP) 2011-07-21 US disclosed
EP-2261737-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING CURED FILM FROM THE SAME FUJIFILM Corporation (JP) 2010-12-15 EP disclosed
US-20100173246-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING CURED FILM USING THE SAME FUJIFILM CORPORATION (JP) 2010-07-08 US disclosed
EP-2196852-A1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, AND METHOD FOR FORMATION OF CURED FILM USING THE SAME Fujifilm Corporation (JP) 2010-06-16 EP disclosed
US-20100119973-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2010-05-13 US disclosed
EP-2154571-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING CURED FILM THEREFROM Fujifilm Corporation (JP) 2010-02-17 EP disclosed
EP-2130095-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM FORMING METHOD USING THE SAME Fujifilm Corporation (JP) 2009-12-09 EP disclosed
WO-2008123563-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-16 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180009775-A1 LATENT ACIDS AND THEIR USE LTA, C1S, C9 ALDH1A1 217/4885TSHR 3529/4885TDP1 3849/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.