Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.53 |
| ▸ | CA12 | O43570 | 1/20 | 0.53 |
| ▸ | CA1 | P00915 | 1/20 | 0.53 |
| ▸ | CA2 | P00918 | 1/20 | 0.53 |
| ▸ | TSHR | P16473 | 1/20 | 0.53 |
| ▸ | CA7 | P43166 | 1/20 | 0.53 |
| ▸ | CA9 | Q16790 | 1/20 | 0.53 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.53 |
| ▸ | PPARD | Q03181 | 1/20 | 0.52 |
| ▸ | MAOB | P27338 | 4/20 | 0.49 |
| ▸ | GAA | P10253 | 2/20 | 0.47 |
| ▸ | HNF4A | P41235 | 1/20 | 0.47 |
| ▸ | ACMSD | Q8TDX5 | 1/20 | 0.47 |
| ▸ | PLA2G4A | P47712 | 1/20 | 0.47 |
| ▸ | PRKAB2 | O43741 | 1/20 | 0.46 |
| ▸ | PRKAG1 | P54619 | 1/20 | 0.46 |
| ▸ | PRKAA2 | P54646 | 1/20 | 0.46 |
| ▸ | PRKAA1 | Q13131 | 1/20 | 0.46 |
| ▸ | PRKAG3 | Q9UGI9 | 1/20 | 0.46 |
| ▸ | PRKAG2 | Q9UGJ0 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29664618 | 1.00 | ALDH1A1 (0.53) | ALDH1A1CA12CA1CA2TSHR | |
| SCHEMBL11044502 | 0.92 | PPARD (0.55) | ALDH1A1CA12CA1CA2TSHR | |
| SCHEMBL3658911 | 0.90 | PPARD (0.54) | ALDH1A1CA12CA1CA2TSHR | |
| SCHEMBL3302212 | 0.89 | PPARD (0.52) | ALDH1A1CA12CA1CA2TSHR | |
| SCHEMBL3298167 | 0.89 | PPARD (0.52) | ALDH1A1CA12CA1CA2TSHR | |
| SCHEMBL3904366 | 0.88 | CA12 (0.52) | ALDH1A1CA12CA1CA2TSHR | |
| SCHEMBL10946220 | 0.88 | NPC1 (0.58) | ALDH1A1PPARDMAOBGAACYP3A4 | |
| SCHEMBL14104475 | 0.86 | ALDH1A1 (0.53) | ALDH1A1CA12CA1CA9GAA | |
| SCHEMBL538994 | 0.85 | KMT2A (0.55) | ALDH1A1CA12CA1CA2TSHR | |
| SCHEMBL538636 | 0.85 | PPARD (0.58) | TSHRPPARDMAOBMCL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110157251-B | Curing agent composition and coating composition comprising same | ＫＣＣ公司 | 2022-04-01 | — | — | CN | claimed |
| US-10191398-B2 | Electrophotographic photoconductor, image forming apparatus, and process cartridge | RICOH COMPANY, LTD. (JP) | 2019-01-29 | — | — | US | claimed |
| US-5480761-A | CHROMOGENIC PHOTOGRAPHIC ELEMENTS WITH DIFFUSION TRANSFER | EASTMAN KODAK COMPANY (US) | 1996-01-02 | — | — | US | claimed |
| JP-2101048-A | — | — | None | — | — | JP | disclosed |
| US-20250362596-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN, AND RADIATION-SENSITIVE ACID GENERATOR | JSR CORPORATION (JP) | 2025-11-27 | — | — | US | disclosed |
| US-12187911-B2 | Method for preparing water-soluble acrylic-modified phenolic-modified epoxy resin, water-soluble acrylic-modified phenolic-modified epoxy resin prepared thereby, and aqueous coating composition comprising same | SAMHWA PAINTS INDUSTRIES CO., LTD. (KR) | 2025-01-07 | — | — | US | disclosed |
| WO-2024181434-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND RADIATION-SENSITIVE ACID GENERATION AGENT | JSR株式会社 | 2024-09-06 | — | — | WO | disclosed |
| US-20240117213-A1 | METHOD FOR PREPARING WATER-SOLUBLE ACRYLIC-MODIFIED PHENOLIC-MODIFIED EPOXY RESIN, WATER-SOLUBLE ACRYLIC-MODIFIED PHENOLIC-MODIFIED EPOXY RESIN PREPARED THEREBY, AND AQUEOUS COATING COMPOSITION COMPRISING SAME | SAMHWA PAINTS INDUSTRIES CO., LTD. (KR) | 2024-04-11 | — | — | US | disclosed |
| CN-110157251-B | Curing agent composition and coating composition comprising same | ＫＣＣ公司 | 2022-04-01 | — | — | CN | disclosed |
| US-11016403-B2 | Electrophotographic photoconductor, image forming apparatus, and process cartridge | RICOH COMPANY, LTD. (JP) | 2021-05-25 | — | — | US | disclosed |
| US-20200233325-A1 | ELECTROPHOTOGRAPHIC PHOTOCONDUCTOR, IMAGE FORMING APPARATUS, AND PROCESS CARTRIDGE | RICOH COMPANY, LTD. (JP) | 2020-07-23 | — | — | US | disclosed |
| EP-2342173-A1 | SALICYLIC ACID DERIVATIVES BEING FARNESYL PYROPHOSPHATE SYNTHASE ACTIVITY INHIBITORS | Novartis AG (CH) | 2011-07-13 | — | — | EP | disclosed |
| WO-2010043584-A1 | SALICYLIC ACID DERIVATIVES BEING FARNESYL PYROPHOSPHATE SYNTHASE ACTIVITY INHIBITORS | NOVARTIS AG (CH) | 2010-04-22 | — | — | WO | disclosed |
| US-20100072416-A1 | HEAT-DISSIPATING RESIN COMPOSITION, SUBSTRATE FOR LED MOUNTING, REFLECTOR, AND SUBSTRATE FOR LED MOUNTING HAVING REFLECTOR PORTION | TECHNO POLYMER CO. LTD (JP) | 2010-03-25 | — | — | US | disclosed |
| EP-2078736-A1 | HEAT-DISSIPATING RESIN COMPOSITION, SUBSTRATE FOR LED MOUNTING, REFLECTOR, AND SUBSTRATE FOR LED MOUNTING HAVING REFLECTOR PORTION | Techno Polymer Co., Ltd. (JP) | 2009-07-15 | — | — | EP | disclosed |
| US-20050075375-A1 | Heterocyclic compounds for treating hepatitis C virus | ANADYS PHARMACEUTICALS, INC. (US) | 2005-04-07 | — | — | US | disclosed |
| WO-2004110351-A2 | HETEROCYCLIC COMPOUNDS FOR TREATING HEPATITIS C VIRUS | ANADYS PHARMACEUTICALS, INC. (US) | 2004-12-23 | — | — | WO | disclosed |
| EP-1091958-A1 | SALTS OF PAROXETINE | SMITHKLINE BEECHAM PLC (GB) | 2001-04-18 | — | — | EP | disclosed |
| WO-2000001692-A1 | SALTS OF PAROXETINE | SMITHKLINE BEECHAM PLC (GB) | 2000-01-13 | — | — | WO | disclosed |
| JP-H02101048-A | PRODUCTION OF SALICYLIC ACID DERIVATIVE | FUJI PHOTO FILM CO LTD | 1990-04-12 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250362596-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN, AND RADIATION-SENSITIVE ACID GENERATOR | RAD1, RER1, RPA1 | ALDH1A1 1491/4885CA12 455/4885CA1 60/4885 |
| US-20050075375-A1 | Heterocyclic compounds for treating hepatitis C virus | HAVCR2, HCCS, LIPC | ALDH1A1 287/4885CA12 2449/4885CA1 4432/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.