SCHEMBL6324941

SCHEMBL6324941

COc1c(-c2ccccc2)c1=O

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PDE4B Q07343 7/20 0.55
PDE4A P27815 5/20 0.55
PDE4C Q08493 5/20 0.55
PDE4D Q08499 5/20 0.55
MAPT P10636 5/20 0.54
HTT P42858 2/20 0.54
LMNA P02545 1/20 0.54
ABCG2 Q9UNQ0 3/20 0.49
ALDH1A1 P00352 7/20 0.46
CYP3A4 P08684 3/20 0.46
MITF O75030 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42
KDM4E B2RXH2 4/20 0.42
MAPK1 P28482 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
HPGD P15428 2/20 0.41
HSD17B10 Q99714 2/20 0.41
CYP2C9 P11712 2/20 0.41
CYP2C19 P33261 2/20 0.41
ABCC1 P33527 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9760097 0.93 PDE4B (0.53) PDE4BPDE4APDE4CPDE4DMAPT
SCHEMBL12181771 0.80 PDE4B (0.71) PDE4BPDE4APDE4CPDE4DMAPT
SCHEMBL22721608 0.77 LMNA (0.48) PDE4BPDE4APDE4CPDE4DMAPT
SCHEMBL9509519 0.77 MAPT (0.48) PDE4BPDE4APDE4CPDE4DMAPT
SCHEMBL10967156 0.74 LMNA (0.62) MAPTHTTLMNAALDH1A1NPSR1
SCHEMBL24049430 0.73 MGAM (0.56) PDE4BPDE4APDE4CPDE4DMAPT
SCHEMBL22081628 0.73 PDE4B (0.55) PDE4BPDE4APDE4CPDE4DMAPT
SCHEMBL21384700 0.73 PDE4B (0.55) PDE4BPDE4APDE4CPDE4DMAPT
SCHEMBL18392174 0.72 HTT (0.88) MAPTHTTLMNAALDH1A1KDM4E
Diphencyprone SCHEMBL105663 0.72 HTT (1.00) MAPTHTTLMNAALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107207456-A Latent acid and application thereof 巴斯夫欧洲公司 2017-09-26 CN disclosed
WO-2016124493-A1 LATENT ACIDS AND THEIR USE BASF SE (DE) 2016-08-11 WO disclosed
CN-102781911-B Latent acids and their use BASF SE 2015-07-22 CN disclosed
CN-102186815-B Sulfonium derivatives and the use therof as latent acids BASF SE 2014-07-30 CN disclosed
CN-101952269-B Sulphonium salt initiators BASF SE 2014-06-25 CN disclosed
CN-102026967-B Sulphonium salt initiators CIBA HOLDING INC 2013-09-18 CN disclosed
CN-101522613-B Sulphonium salt photoinitiators CIBA HOLDING INC 2013-03-06 CN disclosed
CN-102781911-A Latent acids and their use BASF SE 2012-11-14 CN disclosed
CN-1989455-B Oxime derivatives and the use therof as latent acids CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2011-12-21 CN disclosed
CN-102186815-A Sulfonium derivatives and the use therof as latent acids BASF SE 2011-09-14 CN disclosed
CN-100383665-C Onium salts and their use as latent acids CIBA SC HOLDING AG (CH) 2008-04-23 CN disclosed
CN-100338056-C Substituted oxime derivatives and their use as latent acids LIBA SPECIALTY CHEMICALS HOLDI (CH) 2007-09-19 CN disclosed
CN-1989455-A Oxime derivatives and the use therof as latent acids CIBA SC HOLDING AG (CH) 2007-06-27 CN disclosed
CN-1751269-A Halogenated oxime derivatives and their use as latent acids CIBA SC HOLDING AG (CH) 2006-03-22 CN disclosed
CN-1662853-A Onium salts and their use as latent acids CIBA SC HOLDING AG (CH) 2005-08-31 CN disclosed
CN-1213343-C Iodonium salt used as potential acid provider CIBA SPECIATY CHEMICALS HOLDIN (CH) 2005-08-03 CN disclosed
US-6899999-B2 Method of manufacturing composite member, photosensitive composition, porous base material, insulating body and composite member KABUSHIKI KAISHA TOSHIBA (JP) 2005-05-31 US disclosed
CN-1512990-A Substituted oxime derivatives and their use as latent acids �������⻯ѧƷ�ع����޹�˾ 2004-07-14 CN disclosed
US-20030022102-A1 Method of manufacturing composite member, photosensitive composition, porous base material, insulating body and composite member KABUSHIKI KAISHA TOSHIBA (JP) 2003-01-30 US disclosed
CN-1306224-A Iodonium salt used as potential acid provider CIBA SPECIATY CHEMICALS HOLDIN (CH) 2001-08-01 CN disclosed