Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 2/20 | 0.38 |
| ▸ | S1PR1 | P21453 | 10/20 | 0.37 |
| ▸ | S1PR3 | Q99500 | 5/20 | 0.37 |
| ▸ | S1PR5 | Q9H228 | 1/20 | 0.36 |
| ▸ | ECE1 | P42892 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | ALKBH5 | Q6P6C2 | 1/20 | 0.33 |
| ▸ | SUCNR1 | Q9BXA5 | 1/20 | 0.33 |
| ▸ | EGLN1 | Q9GZT9 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL383965 | 0.79 | — | — | |
| SCHEMBL109879 | 0.78 | LMNA (0.53) | LTA4HECE1LMNAALKBH5SUCNR1 | |
| SCHEMBL5029763 | 0.78 | DGKA (0.34) | LTA4H | |
| SCHEMBL15330241 | 0.76 | ALDH1A1 (0.50) | LTA4HS1PR1S1PR3TSHR | |
| SCHEMBL17433002 | 0.75 | LMNA (0.50) | LTA4HECE1LMNAALKBH5SUCNR1 | |
| SCHEMBL12491912 | 0.75 | LMNA (0.50) | LTA4HECE1LMNAALKBH5SUCNR1 | |
| SCHEMBL28473579 | 0.75 | LMNA (0.50) | LTA4HECE1LMNAALKBH5SUCNR1 | |
| SCHEMBL162041 | 0.75 | LMNA (0.50) | LTA4HECE1LMNAALKBH5SUCNR1 | |
| SCHEMBL20415450 | 0.75 | LMNA (0.50) | LTA4HECE1LMNAALKBH5SUCNR1 | |
| SCHEMBL5035377 | 0.75 | LMNA (0.50) | LTA4HECE1LMNAALKBH5SUCNR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101625524-B | Photoresist composition and pattern forming method | SHINETSU CHEMICAL CO JP | 2012-11-28 | — | — | CN | disclosed |
| CN-102591152-A | Resist composition and patterning process | SHIN ETSU EHEMICAL CO LTD | 2012-07-18 | — | — | CN | disclosed |
| CN-102520581-A | Method for forming photoresist pattern | SHINETSU CHEMICAL CO | 2012-06-27 | — | — | CN | disclosed |
| CN-101625524-A | Photoresist composition and pattern forming method | SHINETSU CHEMICAL CO | 2010-01-13 | — | — | CN | disclosed |
| US-20050079446-A1 | Novel polymerizable compound, polymer, positive-resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-04-14 | — | — | US | disclosed |
| US-20050079440-A1 | Novel polymer, positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-04-14 | — | — | US | disclosed |