Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 8/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 8/20 | 0.47 |
| ▸ | TSHR | P16473 | 7/20 | 0.47 |
| ▸ | TP53 | P04637 | 6/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 5/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 5/20 | 0.47 |
| ▸ | CYP2D6 | P10635 | 5/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.47 |
| ▸ | LMNA | P02545 | 4/20 | 0.47 |
| ▸ | USP2 | O75604 | 2/20 | 0.47 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.47 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.47 |
| ▸ | RAB9A | P51151 | 5/20 | 0.46 |
| ▸ | NPC1 | O15118 | 4/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.46 |
| ▸ | HPGD | P15428 | 2/20 | 0.44 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29353355 | 1.00 | ALDH1A1 (0.47) | ALDH1A1HSD17B10SMN1; SMN2TSHRTP53 | |
| SCHEMBL6330998 | 0.85 | ADORA2A (0.47) | ALDH1A1HSD17B10SMN1; SMN2TP53KDM4E | |
| SCHEMBL393466 | 0.85 | CYP1A2 (0.40) | ALDH1A1HSD17B10SMN1; SMN2TSHRTP53 | |
| SCHEMBL544836 | 0.84 | ALDH1A1 (0.49) | ALDH1A1HSD17B10SMN1; SMN2TSHRTP53 | |
| SCHEMBL3190486 | 0.82 | NPSR1 (0.44) | ALDH1A1HSD17B10SMN1; SMN2TSHRKDM4E | |
| SCHEMBL29350011 | 0.82 | IDO1 (0.42) | ALDH1A1HSD17B10SMN1; SMN2TSHRTP53 | |
| SCHEMBL62367 | 0.82 | IDO1 (0.42) | ALDH1A1HSD17B10SMN1; SMN2TSHRTP53 | |
| SCHEMBL10344664 | 0.82 | ALDH1A1 (0.41) | ALDH1A1HSD17B10SMN1; SMN2TSHRTP53 | |
| SCHEMBL16928136 | 0.81 | CYP1A2 (0.56) | ALDH1A1HSD17B10TSHRTP53CYP1A2 | |
| SCHEMBL23066466 | 0.81 | ALDH1A1 (0.61) | ALDH1A1HSD17B10SMN1; SMN2TSHRTP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 347 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0324242-A2 | Colored foamlike pressure-sensitive adhesive tape | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1989-07-19 | — | — | EP | claimed |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-24 | — | — | US | disclosed |
| US-12503551-B2 | Fluorine-containing isocyanul compound | DAIKIN INDUSTRIES, LTD. (JP) | 2025-12-23 | — | — | US | disclosed |
| EP-4617775-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, PATTERN FORMING METHOD, AND LIGHT-EMITTING ELEMENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-17 | — | — | EP | disclosed |
| EP-4600743-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN MEMBRANE, PHOTOSENSITIVE DRY FILM, PATTERN FORMATION METHOD, AND LIGHT-EMITTING ELEMENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-08-13 | — | — | EP | disclosed |
| EP-4600741-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COATING, PHOTOSENSITIVE DRY FILM, PATTERN FORMING METHOD, AND LIGHT-EMITTING ELEMENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-08-13 | — | — | EP | disclosed |
| US-20250251665-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-08-07 | — | — | US | disclosed |
| US-12216405-B2 | Photosensitive resin composition, photosensitive resin film, photosensitive dry film, patterning process, and light emitting device | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-02-04 | — | — | US | disclosed |
| EP-4257631-B1 | NOVEL COMPOUND HAVING ISOCYANURIC SKELETON AND COMPOSITION IN WHICH SAID COMPOUND IS INCLUDED | DAIKIN IND LTD (JP) | 2024-12-11 | — | — | EP | disclosed |
| WO-2024202643-A1 | METHOD FOR PRODUCING WIRING BOARD | 味の素株式会社 | 2024-10-03 | — | — | WO | disclosed |
| US-5679495-A | TERPOLYMER PHOTORESIST CONTAINING VINYLPHENOL DERIVATIVE, TERT-BUTYL (METH)ACRYLATE, AND A UNIT TO REDUCE ALKALINE SOLUBILITY; DRY ETCH RESISTANCE | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-10-21 | — | — | US | disclosed |
| EP-0789278-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-08-13 | — | — | EP | disclosed |
| EP-0775941-A1 | Radiation sensitive composition for color filters | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-05-28 | — | — | EP | disclosed |
| US-5629135-A | ALKALI-SOLUBLE RESIN, CROSSLINKER, PHOTOACID GENERATOR, SOLVENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-05-13 | — | — | US | disclosed |
| EP-0660187-B1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1997-03-05 | — | — | EP | disclosed |
| US-5556734-A | RESISTS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-09-17 | — | — | US | disclosed |
| EP-0726500-A1 | Chemically amplified, radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-08-14 | — | — | EP | disclosed |
| EP-0660187-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-06-28 | — | — | EP | disclosed |
| EP-0634696-A1 | Chemically amplified resist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-01-18 | — | — | EP | disclosed |
| EP-0554005-A1 | Photopolymerisable components of radiation-sensitive compositions | Du Pont (UK) Limited (GB) | 1993-08-04 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12503551-B2 | Fluorine-containing isocyanul compound | AFF1, FLI1, RIF1 | ALDH1A1 572/4885HSD17B10 2411/4885SMN1; SMN2 2071/4885 |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | PRDM9, ARCN1, PUF60 | ALDH1A1 3281/4885HSD17B10 4119/4885SMN1; SMN2 2618/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.