SCHEMBL6336252

SCHEMBL6336252

CC(C)(C)[I+](OS(=O)(=O)c1ccccc1C(F)(F)F)(c1ccccc1)C(C)(C)C

nearest known ligand 0.44

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 3/20 0.44
▸ MEN1 O00255 2/20 0.44
▸ HSD11B1 P28845 1/20 0.40
▸ SLC22A12 Q96S37 14/20 0.40
▸ ALDH1A1 P00352 1/20 0.40
▸ RAB9A P51151 1/20 0.36
▸ CYP2C9 P11712 1/20 0.36
▸ SLC22A6 Q4U2R8 1/20 0.36
▸ SLC22A8 Q8TCC7 1/20 0.36
▸ SLC22A11 Q9NSA0 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5950044 0.80 CA2 (0.34) HSD11B1
SCHEMBL13290746 0.76 KMT2A (0.51) KMT2AMEN1HSD11B1SLC22A12ALDH1A1
SCHEMBL30513955 0.76 MEN1 (0.47) KMT2AMEN1HSD11B1SLC22A12ALDH1A1
SCHEMBL1285710 0.74 CA1 (0.35) —
SCHEMBL19809922 0.73 MEN1 (0.49) KMT2AMEN1HSD11B1SLC22A12ALDH1A1
SCHEMBL27550502 0.73 MEN1 (0.51) KMT2AMEN1HSD11B1SLC22A12ALDH1A1
SCHEMBL28266652 0.73 MEN1 (0.51) KMT2AMEN1HSD11B1SLC22A12ALDH1A1
SCHEMBL28241695 0.73 MEN1 (0.51) KMT2AMEN1HSD11B1SLC22A12ALDH1A1
SCHEMBL8409303 0.72 MEN1 (0.47) KMT2AMEN1HSD11B1SLC22A12ALDH1A1
SCHEMBL8410833 0.72 KMT2A (0.47) KMT2AMEN1HSD11B1SLC22A12ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20050244745-A1 Photoresist compositions with si-component ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2005-11-03 — — US disclosed
US-6743563-B2 COMPRISING A RESIN, A PHOTOACID GENERATOR COMPOUND, AND AN ACID; IMPROVED STORAGE STABILITY; PREFERABLY CONTAINS AN ESTER SOLVENT SUCH AS ETHYL LACTATE OR PROPYLENE GLYCOL MONOMETHYL ETHER ACETATE SHIPLEY COMPANY, L.L.C. 2004-06-01 — — US disclosed
US-20030044716-A1 Photoresist compositions SHIPLEY COMPANY, L.L.C. 2003-03-06 — — US disclosed
EP-1284443-A1 Photoresist compositions Shipley Co. L.L.C. (US) 2003-02-19 — — EP disclosed
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