Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 3/20 | 0.34 |
| ▸ | CA1 | P00915 | 2/20 | 0.34 |
| ▸ | CA5A | P35218 | 1/20 | 0.34 |
| ▸ | CA9 | Q16790 | 1/20 | 0.34 |
| ▸ | HSD11B1 | P28845 | 3/20 | 0.34 |
| ▸ | PDK1 | Q15118 | 2/20 | 0.33 |
| ▸ | PDK2 | Q15119 | 2/20 | 0.33 |
| ▸ | PDK3 | Q15120 | 2/20 | 0.33 |
| ▸ | PDK4 | Q16654 | 2/20 | 0.33 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.32 |
| ▸ | HTR6 | P50406 | 1/20 | 0.31 |
| ▸ | GPR3 | P46089 | 1/20 | 0.31 |
| ▸ | CA12 | O43570 | 1/20 | 0.30 |
| ▸ | CA7 | P43166 | 1/20 | 0.30 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.30 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
| ▸ | PTPN11 | Q06124 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL379586 | 0.83 | CA1 (0.38) | CA2CA1HSD11B1 | |
| SCHEMBL1771806 | 0.82 | CA2 (0.40) | CA2CA1HSD11B1 | |
| SCHEMBL6336252 | 0.80 | KMT2A (0.44) | HSD11B1 | |
| SCHEMBL1285710 | 0.79 | CA1 (0.35) | CA2CA1CA9CA12CA7 | |
| SCHEMBL5851781 | 0.78 | CA1 (0.32) | CA2CA1CA5ACA9KEAP1 | |
| SCHEMBL1419536 | 0.73 | CXCR2 (0.31) | — | |
| SCHEMBL1658313 | 0.71 | HSD11B1 (0.35) | CA2CA1CA9HSD11B1 | |
| Trifluoromethanesulfonic Acid SCHEMBL443422 | 0.69 | GPR3 (0.46) | CA2CA1CA5ACA9HSD11B1 | |
| SCHEMBL537975 | 0.67 | CA2 (0.33) | CA2CA1CA5ACA9HSD11B1 | |
| Trifluoromethanesulfonic Acid SCHEMBL8735170 | 0.67 | GPR3 (0.47) | CA2CA1CA5ACA9HSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7005216-B2 | Photo mask | RENESAS TECHNOLOGY CORP. (JP) | 2006-02-28 | — | — | US | disclosed |
| US-20030129505-A1 | Krypton fluoride laser lithography; photoresist pattern | RENESAS ELECTRONICS CORPORATION (JP) | 2003-07-10 | — | — | US | disclosed |
| US-5882843-A | ACRYLIC POLYMER, INITIATOR, SOLVENTS, THERMAL CROSSLINKER AND PIGMENTS | HOECHST JAPAN LIMITED (JP) | 1999-03-16 | — | — | US | disclosed |
| EP-0713144-B1 | Photosensitive resin composition | HOECHST JAPAN (JP) | 1998-09-23 | — | — | EP | disclosed |
| EP-0713144-A2 | Photosensitive resin composition | HOECHST JAPAN LIMITED (JP) | 1996-05-22 | — | — | EP | disclosed |
| US-5350485-A | High-resolution lithography and semiconductor device manufacturing method | HITACHI, LTD. (JP) | 1994-09-27 | — | — | US | disclosed |