SCHEMBL633697

SCHEMBL633697

C=C(C)C(=O)Oc1ccc(N=C=O)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 3/20 0.51
KMT2A Q03164 3/20 0.48
ATM Q13315 1/20 0.48
CYP3A4 P08684 2/20 0.39
TSHR P16473 1/20 0.39
LMNA P02545 1/20 0.35
MAPT P10636 2/20 0.35
TRPA1 O75762 1/20 0.35
TDP1 Q9NUW8 2/20 0.33
POLB P06746 2/20 0.33
APEX1 P27695 1/20 0.33
HTT P42858 1/20 0.33
MAPK1 P28482 1/20 0.33
PRSS1 P07477 3/20 0.33
F2 P00734 1/20 0.33
PRSS2 P07478 1/20 0.33
PRSS3 P35030 1/20 0.33
PKM P14618 1/20 0.33
MEN1 O00255 1/20 0.33
RAB9A P51151 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7765430 0.87 ELANE (0.51) ELANEKMT2AATMLMNAMAPT
SCHEMBL14690320 0.82 ELANE (0.57) ELANEKMT2AATMLMNAMAPT
SCHEMBL3420578 0.82 LMNA (0.53) ELANEKMT2ACYP3A4TSHRLMNA
SCHEMBL56436 0.82 ELANE (0.69) ELANEKMT2AATMCYP3A4LMNA
SCHEMBL633163 0.81 ELANE (0.43) ELANEKMT2AATMCYP3A4LMNA
SCHEMBL28536321 0.79 ELANE (0.54) ELANEKMT2AATMLMNAMAPT
SCHEMBL941110 0.77 ELANE (0.64) ELANEKMT2AATMMAPTTRPA1
SCHEMBL14791139 0.77 ELANE (0.51) ELANEKMT2AATMMAPTMAPK1
SCHEMBL12452197 0.77 LMNA (0.52) ELANEKMT2AATMLMNAMAPT
SCHEMBL13621641 0.77 ELANE (0.51) ELANEKMT2AATMLMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 114 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4660705-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RELIEF PATTERN USING SAME, CURED ARTICLE AND ELECTRONIC COMPONENT Toray Industries, Inc. (JP) 2025-12-10 EP disclosed
WO-2025084057-A1 METHOD FOR PRODUCING MONOMER PRECURSOR COMPOSITION 東レ株式会社 2025-04-24 WO disclosed
CN-114929668-B (Meth) acrylate compound having isocyanate group and method for producing same 株式会社力森诺科 2024-08-20 CN disclosed
WO-2024162116-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RELIEF PATTERN USING SAME, CURED ARTICLE AND ELECTRONIC COMPONENT 東レ株式会社 2024-08-08 WO disclosed
CN-118339207-A Polymer emulsion, method for storing same, two-part thermosetting resin composition using same, resin cured film, and coating film 株式会社力森诺科 2024-07-12 CN disclosed
CN-118210200-A Photosensitive resin composition, cured film pattern, and method for producing same 奇美实业股份有限公司 2024-06-18 CN disclosed
CN-118159576-A Copolymer emulsion, and one-part thermosetting resin composition, two-part thermosetting resin composition, paint, resin cured film, and coating film using the copolymer emulsion 株式会社力森诺科 2024-06-07 CN disclosed
WO-2024117161-A1 BLOCKED ISOCYANATE COMPOSITION, (CO)POLYMER, COATING MATERIAL, CURED PRODUCT, AND COATING FILM 株式会社レゾナック 2024-06-06 WO disclosed
WO-2024034518-A1 POLYMER EMULSION, AND SINGLE-LIQUID TYPE THERMOSETTING RESIN COMPOSITION, TWO-LIQUID TYPE THERMOSETTING RESIN COMPOSITION, COATING MATERIAL, RESIN CURED FILM, AND COATING FILM USING SAID POLYMER EMULSION 株式会社レゾナック 2024-02-15 WO disclosed
EP-3842417-B1 COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND RESONAC CORP (JP) 2024-01-24 EP disclosed
US-20090054543-A1 (Meth) Acryloyl Group-Containing Aromatic Isocyanate Compound and Production Process Thereof SHOWA DENKO K.K. (JP) 2009-02-26 US disclosed
US-20090023831-A1 Curable Composition Containing Thiol Compound SHOWA DENKO K.K. (JP) 2009-01-22 US disclosed
EP-1983017-A1 CURABLE COMPOSITION CONTAINING THIOL COMPOUND Showa Denko K.K. (JP) 2008-10-22 EP disclosed
WO-2008069256-A1 POLYMERIZABLE MONOMER COMPOSITION AND METHOD FOR PREVENTING POLYMERIZATION SHOWA DENKO K.K. (JP) 2008-06-12 WO disclosed
CN-101142252-A Aromatic isocyanate compound containing (meth) acryloyl group and method for producing same SHOWA DENKO KK (JP) 2008-03-12 CN disclosed
EP-1866357-A1 (METH)ACRYLOYL GROUP-CONTAINING AROMATIC ISOCYANATE COMPOUND AND PRODUCTION PROCESS THEREOF Showa Denko K.K. (JP) 2007-12-19 EP disclosed
US-20070060760-A1 (Meth) acryloyl group-containing oxetane compound and production method thereof SHOWA DENKO K.K. (JP) 2007-03-15 US disclosed
EP-1713787-A2 (METH) ACRYLOYL GROUP-CONTAINING OXETANE COMPOUND AND PRODUCTION METHOD THEREOF SHOWA DENKO KABUSHIKI KAISHA (JP) 2006-10-25 EP disclosed
WO-2006103979-A1 (METH)ACRYLOYL GROUP-CONTAINING AROMATIC ISOCYANATE COMPOUND AND PRODUCTION PROCESS THEREOF SHOWA DENKO K.K. (JP) 2006-10-05 WO disclosed
WO-2005075445-A2 (METH) ACRYLOYL GROUP-CONTAINING OXETANE COMPOUND AND PRODUCTION METHOD THEREOF SHOWA DENKO K.K. (JP) 2005-08-18 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090054543-A1 (Meth) Acryloyl Group-Containing Aromatic Isocyanate Compound and Production Process Thereof PRMT5, ACR, PRMT1 ELANE 3333/4885KMT2A 1425/4885ATM 62/4885
US-20070060760-A1 (Meth) acryloyl group-containing oxetane compound and production method thereof OXGR1, ALKBH2, OXER1 ELANE 4218/4885KMT2A 863/4885ATM 1017/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.