Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.53 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.48 |
| ▸ | MGAM | O43451 | 2/20 | 0.48 |
| ▸ | GAA | P10253 | 2/20 | 0.48 |
| ▸ | SI | P14410 | 2/20 | 0.48 |
| ▸ | MGAM2 | Q2M2H8 | 2/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | TET2 | Q6N021 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 3/20 | 0.37 |
| ▸ | CA12 | O43570 | 2/20 | 0.37 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | RECQL | P46063 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | HSP90AB1 | P08238 | 1/20 | 0.34 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15549515 | 0.94 | TSHR (0.48) | TSHRHSD17B10MGAMGAASI | |
| SCHEMBL645401 | 0.89 | TDP1 (0.48) | TSHRHSD17B10MGAMGAASI | |
| SCHEMBL14719931 | 0.89 | TDP1 (0.48) | TSHRHSD17B10MGAMGAASI | |
| SCHEMBL338996 | 0.88 | TSHR (0.48) | TSHRHSD17B10MGAMGAASI | |
| SCHEMBL19312144 | 0.87 | TSHR (0.42) | TSHRHSD17B10MGAMGAASI | |
| SCHEMBL20610138 | 0.87 | TDP1 (0.46) | TSHRHSD17B10MGAMGAASI | |
| SCHEMBL20610134 | 0.87 | TDP1 (0.46) | TSHRHSD17B10MGAMGAASI | |
| Ammonia Solution, Strong SCHEMBL9507833 | 0.86 | TSHR (0.46) | TSHRHSD17B10MGAMGAASI | |
| SCHEMBL707591 | 0.86 | TSHR (0.46) | TSHRHSD17B10MGAMGAASI | |
| SCHEMBL10171308 | 0.86 | TSHR (0.46) | TSHRHSD17B10MGAMGAASI |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 769 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-24 | — | — | US | disclosed |
| EP-4660703-A2 | METAL-CONTAINING FILM PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-20250372377-A1 | METAL-CONTAINING FILM PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-12-04 | — | — | US | disclosed |
| US-20250251665-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-08-07 | — | — | US | disclosed |
| EP-4503226-B1 | ELECTROLYTE FOR LITHIUM SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY INCLUDING THE SAME | SK ON CO LTD (KR) | 2025-05-14 | — | — | EP | disclosed |
| EP-4553100-A1 | POLYMER, POSITIVE AND NEGATIVE PHOTOSENSITIVE RESIN COMPOSITIONS, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-05-14 | — | — | EP | disclosed |
| CN-119955091-A | Polymer, positive-type negative-type photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, surface protective film, and electronic component | 信越化学工业株式会社 | 2025-05-09 | — | — | CN | disclosed |
| US-20250147420-A1 | Polymer, Positive And Negative Photosensitive Resin Compositions, Patterning Process, Method For Forming Cured Film, Interlayer Insulating Film, Surface Protective Film, And Electronic Component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-05-08 | — | — | US | disclosed |
| US-20250046871-A1 | ELECTROLYTE FOR LITHIUM SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY INCLUDING THE SAME | SK INNOVATION CO., LTD. (KR) | 2025-02-06 | — | — | US | disclosed |
| EP-4503226-A1 | ELECTROLYTE FOR LITHIUM SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY INCLUDING THE SAME | SK On Co., Ltd. (KR) | 2025-02-05 | — | — | EP | disclosed |
| EP-1148044-A1 | Ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-24 | — | — | EP | disclosed |
| US-20010031424-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. OF (JP) | 2001-10-18 | — | — | US | disclosed |
| US-20010026904-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-04 | — | — | US | disclosed |
| EP-1132774-A2 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-09-12 | — | — | EP | disclosed |
| US-5986042-A | Cross-linked polymer | MITSUI CHEMICALS, INC. (JP) | 1999-11-16 | — | — | US | disclosed |
| US-5958870-A | AN AQUEOUS, STORAGE-STABLE, ACIDIC COMPOSITION OF A LONG ALKYL-CONTAINING BETAINE ESTER OF A FRAGRANCE OR PERFUME ALCOHOL IN THE FORM OF MICELLES; FABRIC SOFTENERS; LAUNDERING; HYDROPHOBIC | THE PROCTER & GAMBLE COMPANY (US) | 1999-09-28 | — | — | US | disclosed |
| EP-0856539-A1 | Cross-linked polymer | Mitsui Chemicals, Inc. (JP) | 1998-08-05 | — | — | EP | disclosed |
| EP-0799885-A1 | Betaine ester compounds of active alcohols | THE PROCTER & GAMBLE COMPANY (US) | 1997-10-08 | — | — | EP | disclosed |
| US-5510402-A | STABILIZING POLYOLEFINS AND STYRENE COPOLYMERS AGAINST HEAT, OXIDATION AND ACTINIC RADIATION | CIBA-GEIGY CORPORATION (US) | 1996-04-23 | — | — | US | disclosed |
| US-4102858-A | LIGHT STABILIZERS FOR PVC AND POLYAMIDES | ARGUS CHEMICAL CORPORATION (US) | 1978-07-25 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250046871-A1 | ELECTROLYTE FOR LITHIUM SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY INCLUDING THE SAME | TERT, LIMS1, KCNN2 | TSHR 4273/4885HSD17B10 882/4885MGAM 1329/4885 |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | PRDM9, ARCN1, PUF60 | TSHR 3402/4885HSD17B10 4119/4885MGAM 3816/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.