Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PRKCA | P17252 | 6/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12430045 | 0.94 | PRKCA (0.31) | PRKCA | |
| SCHEMBL2607857 | 0.89 | — | — | |
| SCHEMBL111509 | 0.86 | CYP3A4 (0.36) | — | |
| SCHEMBL12430032 | 0.81 | CYP3A4 (0.34) | — | |
| SCHEMBL1697128 | 0.80 | ALDH1A1 (0.33) | PRKCA | |
| SCHEMBL1697127 | 0.79 | TSHR (0.33) | — | |
| SCHEMBL10005743 | 0.78 | CHRM2 (0.41) | PRKCA | |
| SCHEMBL22446097 | 0.78 | SMN1; SMN2 (0.30) | — | |
| SCHEMBL17754132 | 0.78 | SMN1; SMN2 (0.30) | — | |
| SCHEMBL12761120 | 0.76 | HMGCR (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9507258-B2 | Resin and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-11-29 | — | — | US | disclosed |
| US-20120178021-A1 | RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-07-12 | — | — | US | disclosed |
| US-20120115082-A1 | RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-05-10 | — | — | US | disclosed |
| US-7977029-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2011-07-12 | — | — | US | disclosed |
| US-7749678-B2 | contains sulfonium compound; improved line edge roughness and pattern profile, and contrast of sensitivity and dissolution in extreme ultraviolet exposure | FUJIFILM CORPORATION (JP) | 2010-07-06 | — | — | US | disclosed |
| US-7514201-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2009-04-07 | — | — | US | disclosed |
| US-20080318159-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-12-25 | — | — | US | disclosed |
| US-7338740-B2 | Positive resist composition | FUJIFILM CORPORATION (JP) | 2008-03-04 | — | — | US | disclosed |
| US-7291441-B2 | Positive resist composition and pattern forming method utilizing the same | FUJIFILM CORPORATION (JP) | 2007-11-06 | — | — | US | disclosed |
| US-7285369-B2 | photoresist composition comprising resins that increases solubility in alkali developing solution by the action of an acid and photoacid generators, which exhibits high sensitivity, high resolution and stability | FUJIFILM CORPORATION (JP) | 2007-10-23 | — | — | US | disclosed |
| US-7252924-B2 | Positive resist composition and method of pattern formation using the same | FUJIFILM CORPORATION (JP) | 2007-08-07 | — | — | US | disclosed |
| US-7241551-B2 | Positive-working resist composition | FUJIFILM CORPORATION (JP) | 2007-07-10 | — | — | US | disclosed |
| US-7235341-B2 | Positive resist composition | FUJIFILM CORPORATION (JP) | 2007-06-26 | — | — | US | disclosed |
| US-20070141513-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-06-21 | — | — | US | disclosed |
| US-7214465-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2007-05-08 | — | — | US | disclosed |
| US-7214733-B2 | Positive type resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-05-08 | — | — | US | disclosed |
| US-7192681-B2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-20 | — | — | US | disclosed |
| US-7189492-B2 | Photosensitive composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |
| US-7179578-B2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7179579-B2 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120178021-A1 | RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SULT1A1, SULT1E1, C1S | PRKCA 4354/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.