⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14435544 | 0.87 | — | — | |
| SCHEMBL1075162 | 0.87 | — | — | |
| SCHEMBL13309236 | 0.87 | — | — | |
| SCHEMBL3387123 | 0.87 | — | — | |
| SCHEMBL8815894 | 0.80 | ALDH1A1 (0.32) | — | |
| SCHEMBL21396628 | 0.80 | — | — | |
| SCHEMBL20715180 | 0.80 | ALDH1A1 (0.32) | — | |
| SCHEMBL8444553 | 0.80 | ALDH1A1 (0.32) | — | |
| SCHEMBL6383420 | 0.80 | ALDH1A1 (0.32) | — | |
| SCHEMBL16116751 | 0.80 | ALDH1A1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9323150-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern | FUJIFILM CORPORATION (JP) | 2016-04-26 | — | — | US | disclosed |
| US-20140227636-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2014-08-14 | — | — | US | disclosed |
| US-7858286-B2 | Positive resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-12-28 | — | — | US | disclosed |
| US-7781144-B2 | Positive resist composition and resist pattern forming method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-08-24 | — | — | US | disclosed |
| US-20100136478-A1 | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO., LTD. | 2010-06-03 | — | — | US | disclosed |
| US-20090035698-A1 | POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-02-05 | — | — | US | disclosed |
| US-20050124658-A1 | Decahydronaphtho[2,3-c]furan derivatives | SEGAMI CHEMICAL RESEARCH CENTER | 2005-06-09 | — | — | US | disclosed |
| EP-1138679-B1 | HYDRONAPHTHO 2,3-c]FURAN DERIVATIVES AND PROCESS FOR THE PREPARATION THEREOF | SAGAMI CHEM RES (JP) | 2003-03-19 | — | — | EP | disclosed |
| US-6392059-B1 | THERAPY FOR ALZHEIMER'S DISEASE | SAGAMI CHEMICAL REASEARCH CENTER (JP) | 2002-05-21 | — | — | US | disclosed |
| EP-1138679-A1 | HYDRONAPHTHO 2,3-c]FURAN DERIVATIVES AND PROCESS FOR THE PREPARATION THEREOF | SAGAMI CHEMICAL RESEARCH CENTER (JP) | 2001-10-04 | — | — | EP | disclosed |