SCHEMBL6357418

SCHEMBL6357418

C=C(C)C(=O)OC1(CC)CCCC1.C=Cc1ccc(OC(C)(C)CC)cc1.C=Cc1ccccc1O

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ADORA3 P0DMS8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6367955 0.93 ADORA3 (0.30) ADORA3
Styrene SCHEMBL6858832 0.87 MEN1 (0.32)
SCHEMBL2773963 0.86 MAPT (0.35)
SCHEMBL7269137 0.85 LMNA (0.34)
SCHEMBL5373653 0.83
SCHEMBL6858336 0.83
SCHEMBL6351754 0.81 ABL1 (0.35)
SCHEMBL7251880 0.78 KDM4E (0.30)
4-Vinylphenol SCHEMBL28475101 0.78 CA12 (0.33)
SCHEMBL7257971 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6949323-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-09-27 US disclosed
US-20030118934-A1 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-06-26 US disclosed