SCHEMBL6362762

SCHEMBL6362762

CCC(C)(C)C(=O)Nc1ccc(C)cc1S(=O)(=O)O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.48
LMNA P02545 1/20 0.48
KMT2A Q03164 4/20 0.44
MEN1 O00255 3/20 0.44
CNR2 P34972 9/20 0.44
ALDH1A1 P00352 2/20 0.43
GAA P10253 2/20 0.43
L3MBTL1 Q9Y468 2/20 0.43
THRB P10828 1/20 0.43
HTT P42858 1/20 0.43
KDM4E B2RXH2 1/20 0.42
MAPT P10636 1/20 0.42
RECQL P46063 1/20 0.42
CASP6 P55212 1/20 0.42
ELAVL1 Q15717 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
CNR1 P21554 5/20 0.41
CYP1A2 P05177 1/20 0.41
CYP2C9 P11712 1/20 0.41
CYP2C19 P33261 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6363306 0.85 MEN1 (0.47) POLBLMNAKMT2AMEN1CNR2
SCHEMBL6362774 0.82 MEN1 (0.62) POLBLMNAKMT2AMEN1CNR2
SCHEMBL19431668 0.82 MEN1 (0.60) POLBLMNAKMT2AMEN1CNR2
SCHEMBL6362837 0.81 LMNA (0.55) POLBLMNAKMT2AMEN1CNR2
SCHEMBL12125138 0.81 LMNA (0.55) POLBLMNAKMT2AMEN1ALDH1A1
SCHEMBL12960523 0.81 L3MBTL1 (0.51) POLBLMNAKMT2AMEN1ALDH1A1
SCHEMBL16015147 0.79 KMT2A (0.48) POLBLMNAKMT2AMEN1ALDH1A1
SCHEMBL12125143 0.78 GAA (0.52) POLBLMNAALDH1A1GAAL3MBTL1
SCHEMBL13973940 0.77 KMT2A (0.50) POLBKMT2AMEN1ALDH1A1GAA
SCHEMBL7527649 0.77 KMT2A (0.53) POLBLMNAKMT2AMEN1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8178271-B2 Polymer having a sulfonic group or a sulfonate group and an amide group and method of producing same CANON KABUSHIKI KAISHA (JP) 2012-05-15 US disclosed
US-20100233610-A1 POLYMER HAVING A SULFONIC GROUP OR A SULFONATE GROUP AND AN AMIDE GROUP AND METHOD OF PRODUCING SAME CANON KABUSHIKI KAISHA (JP) 2010-09-16 US disclosed
US-7795363-B2 Polymer having a sulfonic group or a sulfonate group and an amide group and method of producing same CANON KABUSHIKI KAISHA (JP) 2010-09-14 US disclosed
US-20100121023-A1 POLYMER HAVING A SULFONIC GROUP OR A SULFONATE GROUP AND AN AMIDE GROUP AND METHOD OF PRODUCING SAME CANON KABUSHIKI KAISHA (JP) 2010-05-13 US disclosed
US-7399568-B2 Acrylic amide-resin-coating layer is attached to a carrier core material in a stable manner and which has sufficient charging properties for a toner and excellent environmental stability CANON KABUSHIKI KAISHA (JP) 2008-07-15 US disclosed
US-20070059627-A1 Polymer having a sulfonic group or a sulfonate group and an amide group and method of producing same CANON KABUSHIKI KAISHA (JP) 2007-03-15 US disclosed