SCHEMBL636496

SCHEMBL636496

Cc1ccc(NC(=N)Nc2ccccc2)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 3/20 0.58
RAB9A P51151 8/20 0.55
NPC1 O15118 7/20 0.55
SMN1; SMN2 Q16637 5/20 0.55
MAPT P10636 2/20 0.55
ALDH1A1 P00352 3/20 0.50
CCR6 P51684 1/20 0.50
TDP1 Q9NUW8 2/20 0.48
TP53 P04637 2/20 0.47
MEN1 O00255 1/20 0.47
KMT2A Q03164 1/20 0.47
EGFR P00533 1/20 0.47
MMP1 P03956 1/20 0.47
MMP2 P08253 1/20 0.47
MMP9 P14780 1/20 0.47
POLB P06746 1/20 0.47
RXFP1 Q9HBX9 1/20 0.46
LMNA P02545 2/20 0.46
CXCR2 P25025 1/20 0.46
NFKB1 P19838 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL678436 0.91 TDP1 (0.56) HPGDRAB9ANPC1SMN1; SMN2MAPT
SCHEMBL35172 0.86 HSD17B10 (0.55) RAB9ANPC1SMN1; SMN2MAPTALDH1A1
SCHEMBL20163213 0.86 HSD17B10 (0.55) RAB9ANPC1SMN1; SMN2MAPTALDH1A1
Benzene SCHEMBL27899223 0.86 HSD17B10 (0.55) RAB9ANPC1SMN1; SMN2MAPTALDH1A1
SCHEMBL31160596 0.84 TAS2R38 (0.52) RAB9ANPC1SMN1; SMN2MAPTALDH1A1
Hydrogen Sulfide SCHEMBL28324183 0.84 TAS2R38 (0.52) RAB9ANPC1SMN1; SMN2MAPTALDH1A1
Bromide SCHEMBL473887 0.84 TAS2R38 (0.52) RAB9ANPC1SMN1; SMN2MAPTALDH1A1
Fluoride SCHEMBL20815438 0.84 TAS2R38 (0.52) RAB9ANPC1SMN1; SMN2MAPTALDH1A1
Hydrochloric Acid SCHEMBL5608654 0.84 TAS2R38 (0.52) RAB9ANPC1SMN1; SMN2MAPTALDH1A1
SCHEMBL16692454 0.83 KIF11 (0.49) HPGDRAB9ANPC1SMN1; SMN2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8642718-B2 Curable composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-02-04 US disclosed
EP-1882713-B1 CURABLE COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2013-07-03 EP disclosed
US-8394920-B2 Composition for resin and optical lens obtained therefrom MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-03-12 US disclosed
EP-1775315-B1 POLYMERIZABLE COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2012-02-22 EP disclosed
US-8013084-B2 Manufacturing method and apparatus of optical material SEIKO EPSON CORPORATION (JP) 2011-09-06 US disclosed
EP-1398317-B1 ALICYCLIC COMPOUND FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2011-01-12 EP disclosed
US-20100331515-A1 COMPOSITION FOR RESIN AND OPTICAL LENS OBTAINED THEREFROM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2010-12-30 US disclosed
EP-2243798-A1 COMPOSITION FOR RESIN AND OPTICAL LENS OBTAINED THEREFROM Mitsubishi Gas Chemical Company, Inc. (JP) 2010-10-27 EP disclosed
EP-1319966-B1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2010-05-26 EP disclosed
EP-1426392-B1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2010-02-24 EP disclosed
US-20040158031-A1 Alicyclic compound for optical material MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2004-08-12 US disclosed
US-20040147708-A1 Composition for optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-07-29 US disclosed
US-20040122201-A1 polysulfides; improved impact resistance MITSUBISHI GAS CHEMICAL COMPANY (JP) 2004-06-24 US disclosed
EP-1426392-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-06-09 EP disclosed
EP-1398317-A1 ALICYCLIC COMPOUND FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-03-17 EP disclosed
US-20040024165-A1 Composition for optical material MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2004-02-05 US disclosed
EP-1326095-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-07-09 EP disclosed
EP-1319966-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-06-18 EP disclosed
US-5641724-A AN ELECTRON DONATING CHROMOPHORIC AMINOFLUORAN COMPOUND, AN ELECTRON ACCEPTING COMPOUND AS DEVELOPER IS SELECTED FROM ORGAINC PHOSPHONIC ACID COMPOUNDS, ALIPHATIC CARBOXYLIC COMPOUNDS, A PHENOL COMPOUNDS, ALSO CONTAIN GUANIDINES RICOH COMPANY, LTD. (JP) 1997-06-24 US disclosed
US-5403810-A Reversible thermosensitive coloring composition and reversible thermosensitive recording medium using the same RICOH COMPANY, LTD. (JP) 1995-04-04 US disclosed