Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 4/20 | 0.41 |
| ▸ | HPGD | P15428 | 3/20 | 0.41 |
| ▸ | TSHR | P16473 | 3/20 | 0.41 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.41 |
| ▸ | AR | P10275 | 1/20 | 0.41 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.41 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.41 |
| ▸ | HTR6 | P50406 | 1/20 | 0.41 |
| ▸ | ESRRG | P62508 | 1/20 | 0.41 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | TP53 | P04637 | 2/20 | 0.35 |
| ▸ | MAPT | P10636 | 2/20 | 0.35 |
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | PPARG | P37231 | 1/20 | 0.35 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL635085 | 0.80 | MAOA (0.33) | MAPTMAOA | |
| SCHEMBL19301902 | 0.77 | HTR2C (0.47) | TSHRHSD17B10ALDH1A1MAPTMEN1 | |
| SCHEMBL4650286 | 0.68 | TSHR (0.37) | ESR1HPGDTSHRESR2CYP3A4 | |
| SCHEMBL6796986 | 0.68 | ESR1 (0.41) | ESR1HPGDTSHRESR2CYP3A4 | |
| SCHEMBL635163 | 0.67 | NR1H2 (0.36) | HPGDTSHRCYP3A4 | |
| SCHEMBL14322816 | 0.66 | SLC6A2 (0.38) | HPGDTSHRSLC6A2SLC6A4SLC6A3 | |
| SCHEMBL1402611 | 0.65 | ALDH1A1 (0.34) | ESR1HPGDTSHRESR2CYP3A4 | |
| SCHEMBL1402906 | 0.65 | KMT2A (0.60) | HPGDTSHRARALDH1A1TP53 | |
| SCHEMBL15006819 | 0.64 | ESR2 (0.59) | ESR1HPGDTSHRESR2CYP3A4 | |
| SCHEMBL10629932 | 0.64 | ESR1 (0.41) | ESR1HPGDTSHRESR2CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6201061-B1 | CURING A RESIN FOR OPTICAL USE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-03-13 | — | — | US | claimed |
| WO-2024146848-A1 | CURABLE MATERIALS BASED ON CYCLIC THIOETHER COMPOUNDS, AND USES THEREOF | DELO INDUSTRIE KLEBSTOFFE GMBH & CO. KGAA (DE) | 2024-07-11 | — | — | WO | disclosed |
| EP-1775315-B1 | POLYMERIZABLE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2012-02-22 | — | — | EP | disclosed |
| EP-1398317-B1 | ALICYCLIC COMPOUND FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL CO (JP) | 2011-01-12 | — | — | EP | disclosed |
| EP-1319966-B1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL CO (JP) | 2010-05-26 | — | — | EP | disclosed |
| EP-1426392-B1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL CO (JP) | 2010-02-24 | — | — | EP | disclosed |
| EP-1378535-B1 | POLYMERIZATION REGULATORS AND COMPOSITIONS FOR RESIN | MITSUBISHI GAS CHEMICAL CO (JP) | 2009-11-11 | — | — | EP | disclosed |
| EP-1524289-B1 | POLYMERIZABLE COMPOSITION, OPTICAL MATERIAL COMPRISING THE COMPOSITION AND METHOD FOR PRODUCING THE MATERIAL | MITSUBISHI GAS CHEMICAL CO (JP) | 2009-09-16 | — | — | EP | disclosed |
| EP-1006374-B1 | Process for producing a resin having a large refractive index | MITSUBISHI GAS CHEMICAL CO (JP) | 2009-01-07 | — | — | EP | disclosed |
| US-7446163-B2 | Polymerization regulator and composition for resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2008-11-04 | — | — | US | disclosed |
| EP-1099721-A1 | Composition for producing resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-05-16 | — | — | EP | disclosed |
| US-6201061-B1 | CURING A RESIN FOR OPTICAL USE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-03-13 | — | — | US | disclosed |
| US-6197226-B1 | COMPRISING DIPPING RESIN INTO A LIQUID CONTAINING POLAR COMPOUND SELECTED FROM POLAR INORGANIC COMPOUNDS AND POLAR ORGANIC COMPOUNDS AND TINTING RESIN, WHEREIN RESIN IS OBTAINED BY CURING BY POLYMERIZATION A SULFUR CONTAINING COMPOUND | MITSUBISHI GAS CHEMICAL COMPANY (JP) | 2001-03-06 | — | — | US | disclosed |
| US-6180753-B1 | ADDING ACIDS, CURING AND SOLIDIFICATION WITH CASTING | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-01-30 | — | — | US | disclosed |
| EP-1046931-A2 | Composition for optical materials | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2000-10-25 | — | — | EP | disclosed |
| EP-1024223-A2 | Process for tinting a resin for optical materials | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2000-08-02 | — | — | EP | disclosed |
| EP-1006374-A2 | Process for producing a resin having a large refractive index | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2000-06-07 | — | — | EP | disclosed |
| EP-0980696-A1 | Process for treating a compound having epithio structures for disposal | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2000-02-23 | — | — | EP | disclosed |
| EP-0950905-A2 | Process for producing a novel resin for optical materials having excellent color tone and transparency | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1999-10-20 | — | — | EP | disclosed |
| EP-0928802-A2 | Process for tinting a resin having a large refractivity index and optical material tinted by the process | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1999-07-14 | — | — | EP | disclosed |