SCHEMBL1402906

SCHEMBL1402906

CC(C)(c1ccc(OCC2CS2)cc1)c1ccc(OCC2CS2)cc1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 5/20 0.60
MEN1 O00255 4/20 0.60
ALDH1A1 P00352 3/20 0.60
TP53 P04637 2/20 0.60
MAPT P10636 2/20 0.60
HPGD P15428 2/20 0.60
TSHR P16473 2/20 0.60
HIF1A Q16665 2/20 0.60
CYP1A2 P05177 1/20 0.60
PPARG P37231 1/20 0.60
PSMB1 P20618 1/20 0.44
PSMB5 P28074 1/20 0.44
PSMB2 P49721 1/20 0.44
SMN1; SMN2 Q16637 2/20 0.42
HTT P42858 2/20 0.40
AR P10275 1/20 0.39
KDM4E B2RXH2 4/20 0.37
POLB P06746 1/20 0.37
MMP2 P08253 1/20 0.35
MMP3 P08254 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21264339 0.89 ALDH1A1 (0.80) KMT2AMEN1ALDH1A1TP53MAPT
SCHEMBL3684205 0.89 MEN1 (0.47) KMT2AMEN1ALDH1A1TP53MAPT
SCHEMBL12301079 0.88 HIF1A (0.55) KMT2AMEN1ALDH1A1TP53MAPT
SCHEMBL1402756 0.84 MMP2 (0.39) KMT2AMEN1ALDH1A1TP53MAPT
SCHEMBL15701513 0.82 HIF1A (0.48) KMT2AMEN1ALDH1A1TP53MAPT
SCHEMBL2733521 0.80 PSMB1 (0.47) KMT2AMEN1ALDH1A1TP53MAPT
SCHEMBL2734738 0.79 DRD2 (0.40) ALDH1A1MAPTTSHRSMN1; SMN2KDM4E
SCHEMBL28405250 0.79 TDP1 (0.50) KMT2AKDM4EMMP2MMP3MMP9
SCHEMBL1402783 0.79 FFAR4 (0.38) KMT2AMEN1ALDH1A1TP53MAPT
SCHEMBL4649028 0.76 HPGD (0.38) KMT2AMEN1ALDH1A1TP53MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 98 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2963457-B1 OPTICAL MATERIAL, COMPOSITION FOR USE THEREIN, AND USE THEREOF MITSUI CHEMICALS INC (JP) 2018-07-11 EP claimed
EP-4692937-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, HOLLOW STRUCTURE, ELECTRONIC COMPONENT, AND ELASTIC WAVE FILTER Toray Industries, Inc. (JP) 2026-02-11 EP disclosed
US-20250114986-A1 CURABLE COMPOSITION FOR MECHANICAL FOAMING AND METHOD FOR MANUFACTURING FOAM OF THE SAME THREE BOND CO LTD (JP) 2025-04-10 US disclosed
WO-2024203821-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, HOLLOW STRUCTURE, ELECTRONIC COMPONENT, AND ELASTIC WAVE FILTER 東レ株式会社 2024-10-03 WO disclosed
US-20230340330-A1 COMPOSITION FOR COLOR CONVERSION FILM, COLOR CONVERSION FILM, METHOD FOR MANUFACTURING COLOR CONVERSION FILM, BACKLIGHT UNIT, AND LIQUID CRYSTAL DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2023-10-26 US disclosed
US-20220355517-A1 CURABLE COMPOSITION FOR MECHANICAL FOAMING AND METHOD FOR MANUFACTURING FOAM OF THE SAME THREEBOND CO., LTD. (JP) 2022-11-10 US disclosed
CN-107428040-B Method for manufacturing plastic lens, method for positioning film, and composite body 株式会社HOPNIC研究所 2022-05-31 CN disclosed
US-20210372984-A1 METHOD FOR SETTING POLYMERIZATION CONDITION AND METHOD FOR MANUFACTURING OPTICAL MATERIAL MITSUI CHEMICALS, INC. (JP) 2021-12-02 US disclosed
EP-3901184-A1 OPTICAL MATERIAL COMPOSITION AND OPTICAL MATERIAL Tokuyama Corporation (JP) 2021-10-27 EP disclosed
US-11155669-B2 Curable resin composition, cured product thereof, and bonded body bonded by cured product THREEBOND CO., LTD. (JP) 2021-10-26 US disclosed
US-20080241742-A1 SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN-FORMING METHOD USING THE SURFACE-TREATING AGENT FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080206668-A1 NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed
EP-1962139-A1 Negative resist composition and pattern forming method using the same FUJIFILM Corporation (JP) 2008-08-27 EP disclosed
US-7132501-B2 Polymerizable composition containing novel cyclic sulfur compound and resin obtained by curing the polymerizable composition MITSUI CHEMICALS, INC. (JP) 2006-11-07 US disclosed
US-7098273-B2 Resin composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2006-08-29 US disclosed
EP-1491587-B1 Resin composition MITSUBISHI GAS CHEMICAL CO (JP) 2006-04-05 EP disclosed
US-20050215757-A1 Polymerizable composition containing novel cyclic sulfur compound and resin obtained by curing the polymerizable composition MITSUI CHEMICALS, INC. (JP) 2005-09-29 US disclosed
US-20040266956-A1 Resin composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-12-30 US disclosed
EP-1482002-A1 POLYMERIZABLE COMPOSITION CONTAINING NOVEL CYCLIC SULFUR COMPOUND AND RESIN OBTAINED BY CURING THE POLYMERIZABLE COMPOSITION MITSUI CHEMICALS, INC. (JP) 2004-12-01 EP disclosed
US-6190833-B1 (A) A PHENOL RESIN, (B) AN AMINO RESIN, (C) A COMPOUND HAVING TWO OR MORE CROSSLINKING GROUPS IN A MOLECULE, AND (D) A HALOMETHYL-1,3,5-TRIAZINE COMPOUND. JSR CORPORATION (JP) 2001-02-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080241742-A1 SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN-FORMING METHOD USING THE SURFACE-TREATING AGENT KRT18, FSCN1, SLC11A2 KMT2A 827/4885MEN1 968/4885ALDH1A1 445/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.