SCHEMBL6380279

SCHEMBL6380279

CCC(=O)OC(C(C)C)C(O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.33

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALOX15 P16050 1/20 0.33
MEN1 O00255 1/20 0.31
CYP2C19 P33261 1/20 0.31
RECQL P46063 1/20 0.31
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14204598 0.86 LMNA (0.38) ALOX15
SCHEMBL13856072 0.85 ALOX15 (0.33) ALOX15MEN1CYP2C19RECQLKMT2A
SCHEMBL14204599 0.81 CYP2C19 (0.33) MEN1CYP2C19RECQLKMT2A
SCHEMBL19245749 0.81 MMP1 (0.33)
SCHEMBL10135164 0.79
SCHEMBL10135150 0.79 CYP2D6 (0.31) CYP2C19
SCHEMBL13609279 0.77
SCHEMBL18476622 0.76 CYP2D6 (0.33) CYP2C19
SCHEMBL18478153 0.76
SCHEMBL14204584 0.75 MEN1 (0.33) MEN1CYP2C19RECQLKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1829850-B1 Method for the preparation of fluorinated monomers SHINETSU CHEMICAL CO (JP) 2012-05-16 EP disclosed
US-20080090173-A1 POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. 2008-04-17 US disclosed
US-20080090173-A1 POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. 2008-04-17 US disclosed