SCHEMBL6397169

SCHEMBL6397169

Nc1c(I)c(C(=O)O)c(I)c(C(=O)O)c1I.[NaH]

nearest known ligand 0.32

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.32
KMT2A Q03164 1/20 0.32
TPMT P51580 1/20 0.32
CYP1A2 P05177 1/20 0.31
LMNA P02545 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL377437 0.97 TPMT (0.33) KDM4EKMT2ATPMTCYP1A2LMNA
Hydrochloric Acid SCHEMBL620189 0.95 KDM4E (0.32) KDM4EKMT2ATPMTCYP1A2LMNA
Hydrochloric Acid SCHEMBL28391599 0.95 KDM4E (0.32) KDM4EKMT2ATPMTCYP1A2LMNA
SCHEMBL6389935 0.95 KDM4E (0.32) KDM4EKMT2ATPMTCYP1A2LMNA
SCHEMBL621486 0.92 TPMT (0.33) KDM4EKMT2ATPMTCYP1A2LMNA
SCHEMBL27558458 0.91 LMNA (0.31) LMNA
SCHEMBL3664084 0.88 LMNA (0.32) LMNA
SCHEMBL31086827 0.86 TPMT (0.33) KDM4EKMT2ATPMTCYP1A2LMNA
SCHEMBL3830951 0.86 LMNA (0.34) KDM4EKMT2ALMNA
SCHEMBL3728638 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116143646-A Purification method of 5-amino-2, 4, 6-triiodo isophthaloyl chloride 安庆朗坤药业有限公司 2023-05-23 CN disclosed
US-6908719-B1 Photosensitive compound and photosensitive composition SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2005-06-21 US disclosed
EP-0930540-B1 PHOTOSENSITIVE COMPOSITION AND USE THEREOF SANYO CHEMICAL IND LTD (JP) 2004-06-16 EP disclosed
US-6727034-B1 HIGH SENSITIVITY AND HIGH RESOLUTION; BLACK MATRIX AND PHOSPHOR SCREEN FOR A COLOR PICTURE TUBE SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2004-04-27 US disclosed
CN-1138181-C Photosensitive composition and use thereof 三洋化成工业株式会社 2004-02-11 CN disclosed
CN-1232549-A Photosensitive composition and use thereof SANYO CHEMICAL IND LTD (JP) 1999-10-20 CN disclosed
EP-0930540-A1 PHOTOSENSITIVE COMPOSITION AND USE THEREOF SANYO CHEMICAL INDUSTRIES, LTD. (JP) 1999-07-21 EP disclosed