Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 2/20 | 0.33 |
| ▸ | FAAH | O00519 | 2/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | CA1 | P00915 | 3/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4182735 | 0.81 | — | — | |
| SCHEMBL12750102 | 0.81 | KDM4E (0.33) | CA2KDM4ECYP3A4CA1 | |
| SCHEMBL79143 | 0.80 | — | — | |
| SCHEMBL10493368 | 0.80 | KDM4E (0.36) | CA2KDM4ECYP3A4LMNACA1 | |
| SCHEMBL6690727 | 0.78 | FAAH (0.43) | FAAH | |
| SCHEMBL10042746 | 0.78 | LMNA (0.32) | CA2LMNACA1 | |
| SCHEMBL14420273 | 0.78 | — | — | |
| Methane SCHEMBL9153389 | 0.76 | — | — | |
| SCHEMBL31134117 | 0.76 | — | — | |
| Water SCHEMBL28754572 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 551 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260008932-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-08 | — | — | US | disclosed |
| EP-4675357-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-01-07 | — | — | EP | disclosed |
| CN-119331250-A | Silicon-containing bottom anti-reflection coating composition and preparation method and application thereof | 福建泓光半导体材料有限公司 | 2025-01-21 | — | — | CN | disclosed |
| CN-119264435-A | Organosilicon polymer, silicon-containing bottom anti-reflection coating composition, and preparation methods and applications thereof | 福建泓光半导体材料有限公司 | 2025-01-07 | — | — | CN | disclosed |
| CN-118444529-A | Bottom anti-reflection coating composition, preparation method thereof, and formation method and application of photoetching pattern | 安徽恒坤新材料科技有限公司 | 2024-08-06 | — | — | CN | disclosed |
| CN-118444530-A | Bottom anti-reflection coating composition, preparation method thereof, and formation method and application of photoresist pattern | 安徽恒坤新材料科技有限公司 | 2024-08-06 | — | — | CN | disclosed |
| CN-118164950-A | Preparation method of chiral alkenyl thioflavonoid derivative and chiral alkenyl thioflavonoid derivative | 中国科学院大连化学物理研究所 | 2024-06-11 | — | — | CN | disclosed |
| EP-3382453-B1 | RESIST UNDERLAYER FILM COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | SHINETSU CHEMICAL CO (JP) | 2023-09-20 | — | — | EP | disclosed |
| EP-3266759-B1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND METHOD FOR PURIFYING COMPOUND OR RESIN | MITSUBISHI GAS CHEMICAL CO (JP) | 2023-09-13 | — | — | EP | disclosed |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-02-07 | — | — | US | disclosed |
| US-5372914-A | Pattern forming method | KABUSHIKI KAISHA TOSHIBA (JP) | 1994-12-13 | — | — | US | disclosed |
| US-5348838-A | Photoresist | KABUSHIKI KAISHA TOSHIBA (JP) | 1994-09-20 | — | — | US | disclosed |
| US-5176990-A | Blends of silver salts | EASTMAN KODAK COMPANY (US) | 1993-01-05 | — | — | US | disclosed |
| EP-0079574-B1 | PROCESS FOR PREPARING BIOPTERIN AND ITS DERIVATIVES | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1987-03-04 | — | — | EP | disclosed |
| US-4540783-A | 1',2'-Diacyl-(6R,S)-5,6,7,8-tetrahydro-L-biopterin and process for preparing the same | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1985-09-10 | — | — | US | disclosed |
| EP-0153095-A1 | A process for procuding 5-doxy-L-arabinose | SUNTORY LIMITED (JP) | 1985-08-28 | — | — | EP | disclosed |
| EP-0079574-A1 | Process for preparing biopterin and its derivatives | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1983-05-25 | — | — | EP | disclosed |
| US-4076735-A | Process for the manufacture of aminoanthraquinones | CIBA-GEIGY AG (CH) | 1978-02-28 | — | — | US | disclosed |
| US-3954707-A | Polymers stabilized by bis(alkylsulfonyl)vinylanilines | AMERICAN CYANAMID COMPANY (US) | 1976-05-04 | — | — | US | disclosed |
| US-3933866-A | Process for the manufacture of amino-anthraquinones | CIBA-GEIGY AG (CH) | 1976-01-20 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260008932-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS | ASH2L, ALKBH2, ITGA1 | CA2 291/4885FAAH 3026/4885KDM4E 402/4885 |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | C9, C5, C1R | CA2 1466/4885FAAH 3138/4885KDM4E 821/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.