Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 5/20 | 0.62 |
| ▸ | MEN1 | O00255 | 4/20 | 0.62 |
| ▸ | GAA | P10253 | 2/20 | 0.62 |
| ▸ | ESR1 | P03372 | 1/20 | 0.62 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.62 |
| ▸ | LMNA | P02545 | 2/20 | 0.55 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.55 |
| ▸ | HTR6 | P50406 | 1/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.49 |
| ▸ | MAPT | P10636 | 2/20 | 0.49 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.48 |
| ▸ | HPGD | P15428 | 1/20 | 0.48 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.47 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.47 |
| ▸ | VDR | P11473 | 1/20 | 0.47 |
| ▸ | HTT | P42858 | 1/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.44 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.44 |
| ▸ | HSD17B3 | P37058 | 1/20 | 0.44 |
| ▸ | METAP2 | P50579 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28100041 | 0.91 | KMT2A (0.54) | KMT2AMEN1GAAESR1ESR2 | |
| SCHEMBL8820285 | 0.89 | MEN1 (0.55) | KMT2AMEN1GAAESR1ESR2 | |
| SCHEMBL15442508 | 0.84 | KMT2A (0.60) | KMT2AMEN1GAAESR1ESR2 | |
| SCHEMBL926736 | 0.83 | METAP2 (0.45) | KMT2AMEN1GAAESR1ESR2 | |
| SCHEMBL6935683 | 0.83 | KMT2A (0.51) | KMT2AMEN1GAAESR1ESR2 | |
| SCHEMBL1073454 | 0.83 | MEN1 (0.68) | KMT2AMEN1GAAESR1ESR2 | |
| SCHEMBL2879497 | 0.82 | METAP2 (0.60) | KMT2AMEN1GAAESR1ESR2 | |
| SCHEMBL7572822 | 0.82 | MEN1 (0.59) | KMT2AMEN1GAAESR1ESR2 | |
| SCHEMBL31555138 | 0.82 | MEN1 (0.59) | KMT2AMEN1GAAESR1ESR2 | |
| SCHEMBL2881876 | 0.82 | TUBB4A (0.63) | KMT2AMEN1GAAESR1ESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1462 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240294771-A1 | ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER | Tan Kah Kee Innovation Laboratory (CN) | 2024-09-05 | — | — | US | claimed |
| CN-118244576-A | Photosensitive resin composition and cured film thereof | 罗门哈斯电子材料韩国有限公司 | 2024-06-25 | — | — | CN | claimed |
| WO-2023070957-A1 | ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER | 嘉庚创新实验室 | 2023-05-04 | — | — | WO | claimed |
| CN-113913075-B | Anti-reflective coating composition and crosslinkable polymer | 嘉庚创新实验室 | 2022-09-20 | — | — | CN | claimed |
| EP-3084522-B1 | UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MAKING AND USING THE SAME | MERCK PATENT GMBH (DE) | 2020-09-09 | — | — | EP | claimed |
| EP-3049449-B1 | UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MAKING AND USING | AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) | 2019-01-09 | — | — | EP | claimed |
| US-9181449-B2 | Underlayer composition for promoting self assembly and method of making and using | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2015-11-10 | — | — | US | claimed |
| US-9093263-B2 | Underlayer composition for promoting self assembly and method of making and using | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2015-07-28 | — | — | US | claimed |
| US-20150166821-A1 | UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MAKING AND USING | AZ ELECTRONIC MATERIALS (LUXEMBOURG) | 2015-06-18 | — | — | US | claimed |
| US-20150093912-A1 | UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MAKING AND USING | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) | 2015-04-02 | — | — | US | claimed |
| EP-1951801-B1 | IONIZING RADIATION STABLE THERMOPLASTIC COMPOSITION, METHOD OF MAKING, AND ARTICLES FORMED THEREFROM | SABIC INNOVATIVE PLASTICS IP (NL) | 2013-01-02 | — | — | EP | claimed |
| EP-1951801-A2 | IONIZING RADIATION STABLE THERMOPLASTIC COMPOSITION, METHOD OF MAKING, AND ARTICLES FORMED THEREFROM | General Electric Company (US) | 2008-08-06 | — | — | EP | claimed |
| WO-2007053311-A2 | IONIZING RADIATION STABLE THERMOPLASTIC COMPOSITION, METHOD OF MAKING, AND ARTICLES FORMED THEREFROM | GENERAL ELECTRIC COMPANY (US) | 2007-05-10 | — | — | WO | claimed |
| US-6274286-B1 | Resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-14 | — | — | US | claimed |
| CN-122072436-A | Negative photosensitive resin composition, cured film, and resist film | DIC株式会社 | 2026-05-22 | — | — | CN | disclosed |
| CN-122072438-A | Underlayer composition for manufacturing electronic devices | 杜邦电子材料国际有限责任公司 | 2026-05-22 | — | — | CN | disclosed |
| US-20260140448-A1 | UNDERLAYER COMPOSITION FOR USE IN MANUFACTURING ELECTRONIC DEVICES | DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) | 2026-05-21 | — | — | US | disclosed |
| EP-0875787-A1 | Method for reducing the substrate dependence of resist | Wako Pure Chemical Industries, Ltd. (JP) | 1998-11-04 | — | — | EP | disclosed |
| EP-0789279-A1 | Polymer and resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1997-08-13 | — | — | EP | disclosed |
| EP-0780732-A2 | Polymer composition and resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1997-06-25 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260140448-A1 | UNDERLAYER COMPOSITION FOR USE IN MANUFACTURING ELECTRONIC DEVICES | ARCN1, ASH2L, ITGB4 | KMT2A 1033/4885MEN1 3327/4885GAA 4366/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.