Potassium Ion

Potassium Ion

SCHEMBL6454790

[Al+3].[K+].[NH2-].[NH2-].[NH2-].[NH2-]

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA

The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Potassium Ion SCHEMBL23304 0.82
SCHEMBL67462 0.82
SCHEMBL3128306 0.67
Fluoride Ion SCHEMBL143447 0.67
Potassium Ion SCHEMBL276351 0.67
Lithium Ion SCHEMBL4520287 0.67
Potassium Ion SCHEMBL3889277 0.67
SCHEMBL3125937 0.67
SCHEMBL6456754 0.67
Potassium Ion SCHEMBL11752891 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20050020748-A1 Molded article of a crosslinked fluorine-containing elastomer containing an inorganic filler; heat resistance for use at high temperature, resistance to high density plasma; use sealing semiconductor manufacturing equipment DAIKIN INDUSTRIES, LTD. (JP) 2005-01-27 US disclosed
EP-1464671-A1 ELASTOMER FORMED PRODUCT Daikin Industries, Ltd. (JP) 2004-10-06 EP disclosed