Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRM2 | P08172 | 2/20 | 0.46 |
| ▸ | ADRA2B | P18089 | 2/20 | 0.46 |
| ▸ | DRD3 | P35462 | 2/20 | 0.46 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.46 |
| ▸ | HRH3 | Q9Y5N1 | 2/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.45 |
| ▸ | LMNA | P02545 | 2/20 | 0.45 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.44 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.44 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.44 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.44 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | PADI1 | Q9ULC6 | 1/20 | 0.41 |
| ▸ | PADI4 | Q9UM07 | 1/20 | 0.41 |
| ▸ | SMYD3 | Q9H7B4 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9774559 | 0.98 | CHRM2 (0.49) | CHRM2ADRA2BDRD3SIGMAR1HRH3 | |
| SCHEMBL23886458 | 0.96 | CHRM2 (0.42) | CHRM2ADRA2BDRD3SIGMAR1HRH3 | |
| SCHEMBL2968891 | 0.85 | CHRM2 (0.45) | CHRM2ADRA2BDRD3SIGMAR1HRH3 | |
| SCHEMBL18167012 | 0.85 | POLB (0.43) | ALDH1A1CYP2D6POLBMAPTSMN1; SMN2 | |
| SCHEMBL12285113 | 0.85 | KDM4E (0.40) | ALDH1A1LMNACYP2D6PADI1PADI4 | |
| SCHEMBL16267241 | 0.83 | PADI1 (0.55) | SIGMAR1ALDH1A1LMNACYP2D6CHRM3 | |
| SCHEMBL1816293 | 0.83 | ALDH1A1 (0.64) | ALDH1A1LMNAMAPTSMN1; SMN2MITF | |
| SCHEMBL12251157 | 0.83 | PADI1 (0.55) | SIGMAR1ALDH1A1LMNACYP2D6CHRM3 | |
| SCHEMBL14451893 | 0.83 | ALDH1A1 (0.44) | CHRM2ADRA2BDRD3SIGMAR1HRH3 | |
| SCHEMBL25322115 | 0.82 | CHRM2 (0.49) | CHRM2ADRA2BDRD3SIGMAR1HRH3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 457 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4660703-A2 | METAL-CONTAINING FILM PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-12032287-B2 | Resist material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-09 | — | — | US | disclosed |
| US-11994798-B2 | Resist material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-05-28 | — | — | US | disclosed |
| EP-3084152-B1 | FLUORINATED OLEFINS AS WORKING FLUIDS AND METHODS OF USING SAME | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2023-05-31 | — | — | EP | disclosed |
| US-20210063873-A1 | RESIST MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-03-04 | — | — | US | disclosed |
| US-20210063871-A1 | RESIST MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-03-04 | — | — | US | disclosed |
| US-10557069-B2 | Fluorinated olefins as working fluids and methods of using same | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2020-02-11 | — | — | US | disclosed |
| US-20190225852-A1 | FLUORINATED OLEFINS AS WORKING FLUIDS AND METHODS OF USING SAME | 3M INNOVATIVE PROPERTIES CO (US) | 2019-07-25 | — | — | US | disclosed |
| US-10280351-B2 | Fluorinated olefins as working fluids and methods of using same | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2019-05-07 | — | — | US | disclosed |
| US-20180320040-A1 | FLUORINATED OLEFINS AS WORKING FLUIDS AND METHODS OF USING SAME | 3M INNOVATIVE PROPERTIES COMPANY | 2018-11-08 | — | — | US | disclosed |
| US-20020150835-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-10-17 | — | — | US | disclosed |
| US-20020132182-A1 | Polymers, resist materials, and pattern formation method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-09-19 | — | — | US | disclosed |
| EP-1236745-A2 | Silicon-containing polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-09-04 | — | — | EP | disclosed |
| US-20020115807-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-08-22 | — | — | US | disclosed |
| US-20020115821-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-08-22 | — | — | US | disclosed |
| US-20020102493-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-08-01 | — | — | US | disclosed |
| US-20020098443-A1 | Amine compounds, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-07-25 | — | — | US | disclosed |
| US-20020061463-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-05-23 | — | — | US | disclosed |
| EP-1195390-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-04-10 | — | — | EP | disclosed |
| US-4985556-A | INTERMEDIATES | AGENCY OF INDUSTRIAL SCIENCE & TECHNOLOGY (JP) | 1991-01-15 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20020098443-A1 | Amine compounds, resist compositions and patterning process | PARG, EHMT1, EHMT2 | CHRM2 1996/4885ADRA2B 3301/4885DRD3 1089/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.