Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 1/20 | 0.55 |
| ▸ | CA1 | P00915 | 3/20 | 0.47 |
| ▸ | CA2 | P00918 | 3/20 | 0.47 |
| ▸ | PRSS1 | P07477 | 3/20 | 0.47 |
| ▸ | PRSS2 | P07478 | 3/20 | 0.47 |
| ▸ | PRSS3 | P35030 | 3/20 | 0.47 |
| ▸ | CA9 | Q16790 | 2/20 | 0.47 |
| ▸ | FAAH | O00519 | 1/20 | 0.47 |
| ▸ | ELANE | P08246 | 1/20 | 0.47 |
| ▸ | PRTN3 | P24158 | 1/20 | 0.47 |
| ▸ | CA5A | P35218 | 1/20 | 0.47 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | MMP1 | P03956 | 1/20 | 0.42 |
| ▸ | MMP2 | P08253 | 1/20 | 0.42 |
| ▸ | MMP9 | P14780 | 1/20 | 0.42 |
| ▸ | MMP8 | P22894 | 1/20 | 0.42 |
| ▸ | MMP13 | P45452 | 1/20 | 0.42 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4465657 | 0.85 | HTR6 (0.44) | KMT2ACA1CA2PRSS1PRSS2 | |
| SCHEMBL1972890 | 0.85 | KMT2A (0.65) | KMT2ACA1CA2PRSS1PRSS2 | |
| SCHEMBL218621 | 0.81 | HTR6 (0.44) | KMT2ACA1CA2CA9CA5A | |
| SCHEMBL4485970 | 0.79 | PSIP1 (0.52) | KMT2ACA1CA2CA9CA5A | |
| SCHEMBL11438308 | 0.78 | KMT2A (0.57) | KMT2ACA1CA2PRSS1PRSS2 | |
| SCHEMBL218711 | 0.78 | HTR6 (0.41) | CA1CA2CA9CA5AMMP1 | |
| SCHEMBL11036282 | 0.75 | KMT2A (0.59) | KMT2ACA1CA2PRSS1PRSS2 | |
| SCHEMBL6652822 | 0.74 | TDP1 (0.49) | KMT2ACA1CA2CA9CA5A | |
| SCHEMBL3454429 | 0.74 | SMN1; SMN2 (0.40) | CA1CA2CA9CA5AMMP1 | |
| SCHEMBL29671360 | 0.74 | KMT2A (0.53) | KMT2ACA1CA2PRSS1PRSS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150076552-A1 | SILICONE RESIN COMPOSITION, SEMI-CURED MATERIAL SHEET, PRODUCING METHOD OF SILICONE CURED MATERIAL, LIGHT EMITTING DIODE DEVICE, AND PRODUCING METHOD THEREOF | NITTO DENKO CORPORATION (JP) | 2015-03-19 | — | — | US | disclosed |
| US-20130341671-A1 | SILICONE RESIN COMPOSITION, SEMI-CURED MATERIAL SHEET, PRODUCING METHOD OF SILICONE CURED MATERIAL, LIGHT EMITTING DIODE DEVICE, AND PRODUCING METHOD THEREOF | NITTO DENKO CORPORATION (JP) | 2013-12-26 | — | — | US | disclosed |
| EP-2677005-A1 | Silicone resin composition, semi-cured material sheet, producing method of silicone cured material, light emitting diode device, and producing method thereof | NITTO DENKO CORPORATION (JP) | 2013-12-25 | — | — | EP | disclosed |
| US-8119323-B2 | Process for producing patterned film and photosensitive resin composition | SEKISUI CHEMICAL CO., LTD. (JP) | 2012-02-21 | — | — | US | disclosed |
| US-20090206328-A1 | Silicon-Containing Photosensitive Composition, Method for Forming Thin Film Pattern Using Same, Protective Film for Electronic Device, Gate Insulating Film And Thin Film Transistor | Matsukawa, Kimihiro (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20090202942-A1 | PROCESS FOR PRODUCING PATTERNED FILM AND PHOTOSENSITIVE RESIN COMPOSITION | SEKISUI CHEMICAL CO., LTD. (JP) | 2009-08-13 | — | — | US | disclosed |
| EP-1835344-A1 | SILICON-CONTAINING PHOTOSENSITIVE COMPOSITION, METHOD FOR FORMING THIN FILM PATTERN USING SAME, PROTECTIVE FILM FOR ELECTRONIC DEVICE, GATE INSULATING FILM AND THIN FILM TRANSISTOR | SEKISUI CHEMICAL CO., LTD. (JP) | 2007-09-19 | — | — | EP | disclosed |
| EP-1004936-B1 | RESIST RESIN, RESIST RESIN COMPOSITION, AND PROCESS FOR PATTERNING THEREWITH | SHOWA DENKO KK (JP) | 2003-10-08 | — | — | EP | disclosed |
| US-6303268-B1 | SENSITIVITY TO RADIATION | SHOWA DENKO K.K. (JP) | 2001-10-16 | — | — | US | disclosed |
| EP-1004936-A1 | RESIST RESIN, RESIST RESIN COMPOSITION, AND PROCESS FOR PATTERNING THEREWITH | Showa Denko K K (JP) | 2000-05-31 | — | — | EP | disclosed |