SCHEMBL6652822

SCHEMBL6652822

CCCS(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.49
PSIP1 O75475 1/20 0.47
ABCB1 P08183 2/20 0.41
GAA P10253 2/20 0.40
PKM P14618 1/20 0.40
SMN1; SMN2 Q16637 2/20 0.39
ALDH1A1 P00352 2/20 0.38
TSHR P16473 2/20 0.38
HTR6 P50406 1/20 0.38
HSD11B1 P28845 1/20 0.38
MAPT P10636 2/20 0.36
HSD17B10 Q99714 1/20 0.35
CA12 O43570 1/20 0.35
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
CA3 P07451 1/20 0.35
CA4 P22748 1/20 0.35
CA6 P23280 1/20 0.35
CA5A P35218 1/20 0.35
CA7 P43166 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL562842 0.89 TDP1 (0.50) TDP1PSIP1ABCB1SMN1; SMN2ALDH1A1
SCHEMBL4465657 0.88 HTR6 (0.44) TDP1PSIP1PKMSMN1; SMN2ALDH1A1
SCHEMBL7575486 0.87 ALDH1A1 (0.43) TDP1PSIP1ALDH1A1HSD11B1MAPT
SCHEMBL453414 0.86 TDP1 (0.47) TDP1PSIP1ABCB1ALDH1A1TSHR
SCHEMBL1664176 0.86 TDP1 (0.47) TDP1PSIP1ABCB1ALDH1A1TSHR
SCHEMBL4485970 0.86 PSIP1 (0.52) TDP1PSIP1ABCB1SMN1; SMN2ALDH1A1
SCHEMBL8317872 0.85 TDP1 (0.38) TDP1PSIP1ABCB1GAAALDH1A1
SCHEMBL28062435 0.85 PSIP1 (0.47) TDP1PSIP1ABCB1GAAPKM
SCHEMBL218711 0.84 HTR6 (0.41) TDP1PSIP1PKMSMN1; SMN2ALDH1A1
SCHEMBL7584257 0.83 PSIP1 (0.45) TDP1PSIP1ABCB1GAAPKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1434091-A1 CHEMICAL-AMPLIFICATION-TYPE POSITIVE RADIATION-SENSITIVE RESIN COMPOSITION Clariant International Ltd. (CH) 2004-06-30 EP disclosed
CN-1478220-A Chemically amplified positive radiation-sensitive resin composition ���Ͽع����޹�˾ 2004-02-25 CN disclosed
US-20040033438-A1 Chemical-amplication-type positive radiation-sensitive resin composition AZ ELECTRONIC MATERIALS USA CORP. 2004-02-19 US disclosed
US-20020196896-A1 Exposure method, exposure apparatus, X-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-12-26 US disclosed
EP-1193553-A2 Exposure method, exposure apparatus, x-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-04-03 EP disclosed