Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 3/20 | 0.58 |
| ▸ | GMNN | O75496 | 1/20 | 0.58 |
| ▸ | TP53 | P04637 | 1/20 | 0.58 |
| ▸ | POLB | P06746 | 1/20 | 0.58 |
| ▸ | THRB | P10828 | 1/20 | 0.58 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.58 |
| ▸ | BLM | P54132 | 1/20 | 0.58 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.58 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.56 |
| ▸ | CES2 | O00748 | 5/20 | 0.53 |
| ▸ | CES1 | P23141 | 6/20 | 0.50 |
| ▸ | NAAA | Q02083 | 1/20 | 0.49 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.47 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.47 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.47 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.47 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.47 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.47 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.47 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14998165 | 1.00 | MAPT (0.58) | MAPTGMNNTP53POLBTHRB | |
| SCHEMBL28437029 | 1.00 | MAPT (0.58) | MAPTGMNNTP53POLBTHRB | |
| SCHEMBL15457916 | 1.00 | MAPT (0.58) | MAPTGMNNTP53POLBTHRB | |
| SCHEMBL2522380 | 0.98 | ALDH1A1 (0.58) | MAPTGMNNTP53POLBTHRB | |
| SCHEMBL8756244 | 0.93 | ALDH1A1 (0.59) | MAPTGMNNTP53POLBTHRB | |
| SCHEMBL18737489 | 0.89 | SMN1; SMN2 (0.57) | MAPTGMNNTP53POLBTHRB | |
| SCHEMBL9622162 | 0.89 | MAPT (0.53) | MAPTGMNNTP53POLBTHRB | |
| SCHEMBL3357504 | 0.85 | L3MBTL1 (0.55) | MAPTGMNNTP53POLBTHRB | |
| SCHEMBL17399693 | 0.85 | HSD17B3 (0.63) | MAPTGMNNTP53POLBTHRB | |
| SCHEMBL18737683 | 0.83 | HDAC3 (0.50) | MAPTGMNNTP53POLBTHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2356517-B1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORP (JP) | 2017-01-25 | — | — | EP | disclosed |
| US-9551935-B2 | Pattern forming method and resist composition | FUJIFILM CORPORATION (JP) | 2017-01-24 | — | — | US | disclosed |
| EP-1580598-B1 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM CORP (JP) | 2016-10-12 | — | — | EP | disclosed |
| EP-1536285-B1 | Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition | FUJIFILM CORP (JP) | 2016-01-06 | — | — | EP | disclosed |
| US-9223219-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film | FUJIFILM CORPORATION (JP) | 2015-12-29 | — | — | US | disclosed |
| US-9116437-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2015-08-25 | — | — | US | disclosed |
| US-9051403-B2 | Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2015-06-09 | — | — | US | disclosed |
| US-9023576-B2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2015-05-05 | — | — | US | disclosed |
| US-9017917-B2 | Resist composition and method of forming pattern therewith | FUJIFILM CORPORATION (JP) | 2015-04-28 | — | — | US | disclosed |
| US-8999621-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2015-04-07 | — | — | US | disclosed |
| US-20100297553-A1 | POSITIVE RESIST COMPOSITION AND PATTERN-FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-11-25 | — | — | US | disclosed |
| US-20100183980-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-07-22 | — | — | US | disclosed |
| EP-1972641-A2 | Resist composition and pattern-forming method using same | FUJIFILM Corporation (JP) | 2008-09-24 | — | — | EP | disclosed |
| US-7351515-B2 | Positive resist composition and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2008-04-01 | — | — | US | disclosed |
| EP-1835343-A1 | Positive resist composition and pattern formation method using the positive resist composition | FUJIFILM Corporation (JP) | 2007-09-19 | — | — | EP | disclosed |
| US-7202014-B2 | Stimulus-sensitive composition, compound and pattern formation method using the stimulation-sensitive composition | FUJIFILM CORPORATION (JP) | 2007-04-10 | — | — | US | disclosed |
| EP-1767992-A1 | Positive resist composition for immersion exposure and pattern forming method using the same | FUJIFILM Corporation (JP) | 2007-03-28 | — | — | EP | disclosed |
| US-7189492-B2 | Photosensitive composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |
| US-6863701-B2 | Accelerators for cationic photopolymerizations | RENSSELAER POLYTECHNIC INSTITUTE (US) | 2005-03-08 | — | — | US | disclosed |
| US-4399075-A | Process for producing chlorinated phenoxytoluene derivatives | ASAHI CHEMICAL COMPANY, LIMITED (JP) | 1983-08-16 | — | — | US | disclosed |