Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA4 | P22748 | 1/20 | 0.33 |
| ▸ | ESR1 | P03372 | 1/20 | 0.31 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.31 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.31 |
| ▸ | LTA4H | P09960 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL703898 | 0.95 | CA4 (0.33) | CA4ESR1ESR2KCNA3LTA4H | |
| SCHEMBL30690854 | 0.93 | CA4 (0.32) | CA4ESR1ESR2KCNA3 | |
| SCHEMBL30690859 | 0.93 | CA4 (0.32) | CA4ESR1ESR2KCNA3 | |
| SCHEMBL647415 | 0.91 | CA4 (0.36) | CA4ESR1ESR2LTA4HPOLB | |
| SCHEMBL2655578 | 0.90 | LTA4H (0.37) | LTA4H | |
| SCHEMBL24433793 | 0.88 | KIF11 (0.37) | — | |
| SCHEMBL705038 | 0.84 | TP53 (0.32) | CA4ESR1ESR2LTA4H | |
| SCHEMBL647836 | 0.81 | CA4 (0.36) | CA4ESR1ESR2KCNA3LTA4H | |
| SCHEMBL705542 | 0.79 | CA4 (0.35) | CA4ESR1ESR2LTA4HPOLB | |
| SCHEMBL646950 | 0.78 | TSHR (0.33) | LTA4H |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 116 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10474032-B2 | Coating compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-11-12 | — | — | US | disclosed |
| US-9437431-B2 | Electronic device manufacture | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2016-09-06 | — | — | US | disclosed |
| EP-1720075-B1 | Coating compositions | ROHM & HAAS ELECT MAT (US) | 2016-03-02 | — | — | EP | disclosed |
| US-20150072290-A1 | COATING COMPOSITIONS | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2015-03-12 | — | — | US | disclosed |
| US-8911927-B2 | Compositions and processes for immersion lithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-12-16 | — | — | US | disclosed |
| US-8889344-B2 | Coating compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-11-18 | — | — | US | disclosed |
| US-8450045-B2 | Pattern forming method | JSR CORPORATION (JP) | 2013-05-28 | — | — | US | disclosed |
| US-8283260-B2 | Process for restoring dielectric properties | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-10-09 | — | — | US | disclosed |
| US-8263316-B2 | Electronic device manufacture | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-09-11 | — | — | US | disclosed |
| US-20120122036-A1 | PATTERN FORMING METHOD | JSR CORPORATION (JP) | 2012-05-17 | — | — | US | disclosed |
| US-20030008155-A1 | Method for the formation of silica film, silica film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2003-01-09 | — | — | US | disclosed |
| US-20030008244-A1 | Porous optical materials | SHIPLEY COMPANY, L.L.C. (US) | 2003-01-09 | — | — | US | disclosed |
| EP-1267395-A2 | Method for the formation of silica film, silica film, insulating film, and semiconductor device | JSR Corporation (JP) | 2002-12-18 | — | — | EP | disclosed |
| EP-1265080-A2 | Porous optical materials | Shipley Company LLC (US) | 2002-12-11 | — | — | EP | disclosed |
| US-6376634-B1 | ORGANOSILICON POLYMERS | JSR CORPORATION (JP) | 2002-04-23 | — | — | US | disclosed |
| US-20010018129-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1122770-A2 | Silica-based insulating film and its manufacture | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-20010009936-A1 | Method of manufacturing material for forming insulating film | JSR CORPORATION (JP) | 2001-07-26 | — | — | US | disclosed |
| EP-1058274-A1 | Composition for film formation and material for insulating film formation | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-1045290-A2 | Composition for resist underlayer film and method for producing the same | JSR Corporation (JP) | 2000-10-18 | — | — | EP | disclosed |