SCHEMBL646908

SCHEMBL646908

CC(C)(C)OCc1ccccc1COC(C)(C)C

nearest known ligand 0.38

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 12/20 0.38
RIPK1 Q13546 2/20 0.36
HSPA5 P11021 1/20 0.35
GABRA1 P14867 1/20 0.33
GABRB2 P47870 1/20 0.33
BCHE P06276 1/20 0.33
ACHE P22303 1/20 0.33
MAPK1 P28482 1/20 0.33
TK1 P04183 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14008209 0.86 TAAR1 (0.43) ACHE
SCHEMBL18240037 0.84 TAAR1 (0.42) ACHE
SCHEMBL13050671 0.84 ALDH1A1 (0.45) IDO1GABRA1GABRB2BCHEACHE
SCHEMBL18185026 0.84 FDPS (0.38) IDO1
SCHEMBL841507 0.84 IDO1 (0.55) IDO1RIPK1
SCHEMBL13603792 0.84 IDO1 (0.55) IDO1
SCHEMBL8576825 0.84 IDO1 (0.55) IDO1RIPK1
Lithium SCHEMBL18240038 0.84 TAAR1 (0.42) ACHE
SCHEMBL18213797 0.84 HTR1A (0.49)
SCHEMBL18213793 0.83 IDO1 (0.60) IDO1BCHEACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118053799-A Method for manufacturing semiconductor device 株式会社力森诺科 2024-05-17 CN disclosed
CN-117157733-A Method for manufacturing semiconductor device and dicing die-bonding integrated film 株式会社力森诺科 2023-12-01 CN disclosed
CN-110945634-B Heat-dissipating die bonding film and dicing die bonding film 株式会社力森诺科 2023-08-29 CN disclosed
WO-2022255322-A1 METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND DICING-DIE BONDING INTEGRATED FILM 昭和電工マテリアルズ株式会社 2022-12-08 WO disclosed
WO-2022255321-A1 INTEGRATED DICING/DIE BONDING FILM AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE 昭和電工マテリアルズ株式会社 2022-12-08 WO disclosed
CN-112292431-B Crystal cutting and crystal bonding integrated film and pressure-sensitive adhesive film used by same 昭和电工材料株式会社 2022-09-02 CN disclosed
US-20220216114-A1 METHOD FOR EVALUATING PICKUP PERFORMANCE, INTEGRATED DICING/DIE-BONDING FILM, METHOD FOR EVALUATING AND SELECTING INTEGRATED DICING/DIE-BONDING FILM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE RESONAC CORPORATION (JP) 2022-07-07 US disclosed
CN-114641849-A Dicing die-bonding integrated film, method for manufacturing the same, and method for manufacturing semiconductor device 昭和电工材料株式会社 2022-06-17 CN disclosed
CN-114641848-A Dicing die-bonding integrated film, method for manufacturing the same, and method for manufacturing semiconductor device 昭和电工材料株式会社 2022-06-17 CN disclosed
CN-113348533-B Method for evaluating pickup property, die-cut/die-bond integrated film, method for evaluating the same, method for sorting the same, and method for manufacturing semiconductor device 昭和电工材料株式会社 2022-06-03 CN disclosed
EP-2128213-A1 ADHESIVE COMPOSITION FOR OPTICAL WAVEGUIDE, ADHESIVE FILM FOR OPTICAL WAVEGUIDE AND ADHESIVE SHEET FOR OPTICAL WAVEGUIDE EACH USING THE SAME, AND OPTICAL DEVICE USING ANY OF THEM Hitachi Chemical Company, Ltd. (JP) 2009-12-02 EP disclosed
US-20090186955-A1 ADHESIVE COMPOSITION, PROCESS FOR PRODUCING THE SAME, ADHESIVE FILM USING THE SAME, SUBSTRATE FOR MOUNTING SEMICONDUCTOR AND SEMICONDUCTOR DEVICE INADA TEIICHI 2009-07-23 US disclosed
US-7517724-B2 Dicing/die bonding sheet HITACHI CHEMICAL COMPANY, LTD. (JP) 2009-04-14 US disclosed
US-20070036971-A1 Adhesive composition, process for producing the same, adhesive film using the same, substrate for mounting semiconductor and semiconductor device INADA TEIICHI 2007-02-15 US disclosed
US-20070026572-A1 Dicing/die bonding sheet RESONAC CORPORATION (JP) 2007-02-01 US disclosed
US-20060106166-A1 Adhesive composition, process for producing the same, adhesive film using the same, substrate for mounting semiconductor and semiconductor device INADA TEIICHI 2006-05-18 US disclosed
US-20060100315-A1 Adhesive composition, process for producing the same, adhesive film using the same, substrate for mounting semiconductor and semiconductor device INADA TEIICHI 2006-05-11 US disclosed
US-20030069331-A1 An adhesive formulation containing an epoxy resin, a phenolic curing agent and a acrylic copolymer incompatible with epoxy resin HITACHI CHEMICAL CO., LTD. (JP) 2003-04-10 US disclosed
US-6297332-B1 FOR SEALING A SEMICONDUCTOR INTEGRATED CIRCUIT, AMINOPHOSPHINE OXIDE AS IMPROVED ACCELERATING AGENT, PACKAGE BETTER IN CRACK RESISTANCE MITSUI CHEMICALS, INC. (JP) 2001-10-02 US disclosed
EP-0953588-A2 An epoxy-resin composition and use thereof Mitsui Chemicals, Inc. (JP) 1999-11-03 EP disclosed