Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 1/20 | 0.34 |
| ▸ | TP53 | P04637 | 2/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | RELA | Q04206 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | ESR1 | P03372 | 1/20 | 0.31 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.31 |
| ▸ | TSHR | P16473 | 3/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.31 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.31 |
| ▸ | GLA | P06280 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13089267 | 0.90 | MAPT (0.33) | LTA4HTP53MAPTESR1ESR2 | |
| SCHEMBL19130660 | 0.88 | ELANE (0.33) | LTA4HTP53MAPTESR1ESR2 | |
| SCHEMBL13089387 | 0.88 | MAPT (0.33) | LTA4HTP53MAPTESR1ESR2 | |
| SCHEMBL115876 | 0.86 | LTA4H (0.34) | LTA4HTP53MAPTRELANPSR1 | |
| SCHEMBL645725 | 0.86 | LTA4H (0.34) | LTA4HTP53MAPTRELANPSR1 | |
| SCHEMBL707984 | 0.83 | LTA4H (0.32) | LTA4HTP53MAPT | |
| SCHEMBL707895 | 0.83 | LTA4H (0.32) | LTA4HTP53MAPTALDH1A1KDM4E | |
| SCHEMBL647736 | 0.83 | TSHR (0.33) | LTA4HTP53MAPTTSHR | |
| SCHEMBL4081151 | 0.83 | LTA4H (0.32) | LTA4HTP53MAPTALDH1A1KDM4E | |
| SCHEMBL1263434 | 0.83 | LTA4H (0.32) | LTA4HTP53MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 123 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7500397-B2 | Activated chemical process for enhancing material properties of dielectric films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-03-10 | — | — | US | claimed |
| US-20080199977-A1 | Activated Chemical Process for Enhancing Material Properties of Dielectric Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-08-21 | — | — | US | claimed |
| EP-1959485-A2 | Activated chemical process for enhancing material properties of dielectric films | Air Products and Chemicals, Inc. (US) | 2008-08-20 | — | — | EP | claimed |
| US-10474032-B2 | Coating compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-11-12 | — | — | US | disclosed |
| US-9437431-B2 | Electronic device manufacture | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2016-09-06 | — | — | US | disclosed |
| EP-1720075-B1 | Coating compositions | ROHM & HAAS ELECT MAT (US) | 2016-03-02 | — | — | EP | disclosed |
| US-20150072290-A1 | COATING COMPOSITIONS | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2015-03-12 | — | — | US | disclosed |
| US-8911927-B2 | Compositions and processes for immersion lithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-12-16 | — | — | US | disclosed |
| US-8889344-B2 | Coating compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-11-18 | — | — | US | disclosed |
| US-8450045-B2 | Pattern forming method | JSR CORPORATION (JP) | 2013-05-28 | — | — | US | disclosed |
| US-8283260-B2 | Process for restoring dielectric properties | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-10-09 | — | — | US | disclosed |
| EP-1267395-A2 | Method for the formation of silica film, silica film, insulating film, and semiconductor device | JSR Corporation (JP) | 2002-12-18 | — | — | EP | disclosed |
| EP-1265080-A2 | Porous optical materials | Shipley Company LLC (US) | 2002-12-11 | — | — | EP | disclosed |
| US-6376634-B1 | ORGANOSILICON POLYMERS | JSR CORPORATION (JP) | 2002-04-23 | — | — | US | disclosed |
| US-20010018129-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1122770-A2 | Silica-based insulating film and its manufacture | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-20010009936-A1 | Method of manufacturing material for forming insulating film | JSR CORPORATION (JP) | 2001-07-26 | — | — | US | disclosed |
| EP-1117102-A2 | Method of manufacturing material for forming insulating film | JSR Corporation (JP) | 2001-07-18 | — | — | EP | disclosed |
| EP-1058274-A1 | Composition for film formation and material for insulating film formation | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-1045290-A2 | Composition for resist underlayer film and method for producing the same | JSR Corporation (JP) | 2000-10-18 | — | — | EP | disclosed |